SCHEMBL8412922

SCHEMBL8412922

CCCCOC(N)OCCCC

nearest known ligand 0.48

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.48
ADRB1 P08588 1/20 0.48
ADRB3 P13945 1/20 0.48
DNM1 Q05193 1/20 0.44
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
OPRM1 P35372 1/20 0.38
TSHR P16473 3/20 0.36
CYP3A4 P08684 2/20 0.36
ALDH1A1 P00352 1/20 0.35
LMNA P02545 2/20 0.33
SLC2A1 P11166 1/20 0.33
CYP1A2 P05177 2/20 0.32
CYP2C9 P11712 2/20 0.32
CYP2C19 P33261 2/20 0.32
GAA P10253 1/20 0.32
RAB9A P51151 1/20 0.32
PDE4D Q08499 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27605114 0.92 ADRB2 (0.42) ADRB2ADRB1ADRB3DNM1CA1
SCHEMBL2497215 0.81 CA1 (0.33) ADRB2ADRB1ADRB3DNM1CA1
SCHEMBL309205 0.80
Hydrochloric Acid SCHEMBL25266186 0.78
SCHEMBL309212 0.78
SCHEMBL8083306 0.78
SCHEMBL8082714 0.78 DNM1 (0.47) DNM1CA1CA2
SCHEMBL309264 0.76 ADRB2 (0.42) ADRB2ADRB1ADRB3DNM1CA1
SCHEMBL23406867 0.76 ADRB2 (0.42) ADRB2ADRB1ADRB3DNM1CA1
SCHEMBL9393419 0.75 ADRB2 (0.45) ADRB2ADRB1ADRB3DNM1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230273520-A1 Sensitivity Enhanced Photoresists IRRESISTIBLE MATERIALS LTD (GB) 2023-08-31 US claimed
US-11681227-B2 Enhanced EUV photoresist materials, formulations and processes IRRESISTIBLE MATERIALS LTD (GB) 2023-06-20 US claimed
WO-2022026459-A1 SENSITIVITY ENHANCED PHOTORESISTS ROBINSON ALEX P G (GB) 2022-02-03 WO claimed
CN-113994256-A Method for forming EUV patterned resist 亚历克斯·P·G·罗宾逊 2022-01-28 CN claimed
US-20200272050-A1 Enhanced EUV Photoresist Materials, Formulations and Processes IRRESISTIBLE MATERIALS, LTD (GB) 2020-08-27 US claimed
CN-110998437-A Multi-trigger photoresist compositions and methods A·P·G·罗宾森 2020-04-10 CN claimed
CN-110959137-A Resist compositions and methods containing novel multi-trigger monomers A·P·G·罗宾森 2020-04-03 CN claimed
US-20190137876-A1 MULTIPLE TRIGGER MONOMER CONTAINING PHOTORESIST COMPOSITIONS AND METHOD IRRESISTIBLE MATERIALS LTD (GB) 2019-05-09 US claimed
WO-2019046148-A1 MULTIPLE TRIGGER MONOMER CONTAINING PHOTORESIST COMPOSITIONS AND METHOD ROBINSON ALEX PHILLIP GRAHAM (GB) 2019-03-07 WO claimed
US-10095112-B2 Multiple trigger photoresist compositions and methods IRRESISTIBLE MATERIALS LTD (GB) 2018-10-09 US claimed
US-20180246408-A1 MULTIPLE TRIGGER PHOTORESIST COMPOSITIONS AND METHODS IRRESISTIBLE MATERIALS, LTD (GB) 2018-08-30 US claimed
US-20230273520-A1 Sensitivity Enhanced Photoresists IRRESISTIBLE MATERIALS LTD (GB) 2023-08-31 US disclosed
US-11681227-B2 Enhanced EUV photoresist materials, formulations and processes IRRESISTIBLE MATERIALS LTD (GB) 2023-06-20 US disclosed
WO-2022026459-A1 SENSITIVITY ENHANCED PHOTORESISTS ROBINSON ALEX P G (GB) 2022-02-03 WO disclosed
CN-113994256-A Method for forming EUV patterned resist 亚历克斯·P·G·罗宾逊 2022-01-28 CN disclosed
CN-104151233-A Preparation method of agricultural bactericide ZHEJIANG TIDE CROP TECHNOLOGY CO LTD 2014-11-19 CN disclosed
EP-2729463-A1 SUBSTITUTED PHENYL COMPOUNDS SANOFI (FR) 2014-05-14 EP disclosed
WO-2013007502-A1 SUBSTITUTED PHENYL COMPOUNDS SANOFI (FR) 2013-01-17 WO disclosed
EP-0935635-A1 LIQUID CROSS-LINKER COMPOSITIONS CONTAINING 1,3,5-TRIAZINE CARBAMATE/AMINOPLAST RESIN MIXTURES Cytec Technology Corp. (US) 1999-08-18 EP disclosed
WO-1998018856-A1 LIQUID CROSS-LINKER COMPOSITIONS CONTAINING 1,3,5-TRIAZINE CARBAMATE/AMINOPLAST RESIN MIXTURES CYTEC TECHNOLOGY CORP. (US) 1998-05-07 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10095112-B2 Multiple trigger photoresist compositions and methods ERCC4, ERCC2, APEX1 ADRB2 4816/4885ADRB1 4850/4885ADRB3 4798/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.