SCHEMBL9064707

SCHEMBL9064707

Oc1ccc(C(c2ccc(O)cc2O)c2ccc(O)cc2O)cc1

nearest known ligand 0.73

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
TYR P14679 1/20 0.50
ESR1 P03372 1/20 0.41
PDCD1 Q15116 1/20 0.41
ESR2 Q92731 1/20 0.41
CD274 Q9NZQ7 1/20 0.41
ALDH1A1 P00352 1/20 0.40
GAA P10253 1/20 0.40
KMT2A Q03164 1/20 0.40
TDP1 Q9NUW8 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19806928 0.98 TYR (0.52) TYR
SCHEMBL3793824 0.95 TYR (0.50) TYRESR1PDCD1ESR2CD274
SCHEMBL19806923 0.91 TYR (0.47) TYRESR1ESR2
SCHEMBL19806855 0.88 TYR (0.49) TYR
SCHEMBL19806929 0.88 ALOX15 (0.44) TYRESR1ESR2ALDH1A1GAA
SCHEMBL19806857 0.88 TYR (0.53) TYRESR1PDCD1ESR2CD274
SCHEMBL84243 0.87 TYR (0.67) TYRALDH1A1GAAKMT2ATDP1
SCHEMBL28642768 0.85 TYR (0.52) TYRESR1
SCHEMBL19806864 0.85 TYR (0.54) TYRESR1ESR2ALDH1A1GAA
SCHEMBL19806852 0.83 TYR (0.45) TYRESR1ESR2ALDH1A1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210070685-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-11 US disclosed
US-20210070683-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-03-11 US disclosed
WO-2018016640-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD 三菱瓦斯化学株式会社 2018-01-25 WO disclosed
US-5532107-A Positive resist composition NIPPON ZEON CO., LTD. (JP) 1996-07-02 US disclosed
EP-0430477-B1 Positive resist composition NIPPON ZEON CO (JP) 1996-05-22 EP disclosed
US-5306596-A Positive resist composition comprising a polyphenolic o-quinone diazide sulfonate NIPPON ZEON CO., LTD. (JP) 1994-04-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210070683-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD RER1, RTN4, FEM1B TYR 3769/4885ESR1 1539/4885PDCD1 4778/4885
US-20210070685-A1 COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD RER1, RTN4, FEM1B TYR 3769/4885ESR1 1539/4885PDCD1 4778/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.