SCHEMBL8434832

SCHEMBL8434832

CC(=O)c1ccc(OS(=O)(=O)C(F)(F)F)c(OS(=O)(=O)C(F)(F)F)c1OS(=O)(=O)C(F)(F)F

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.44
CXCR2 P25025 2/20 0.36
CXCR1 P25024 1/20 0.35
KDM4E B2RXH2 3/20 0.34
MAPT P10636 3/20 0.34
ALDH1A1 P00352 2/20 0.34
HSD17B10 Q99714 2/20 0.34
CYP2C19 P33261 2/20 0.34
USP2 O75604 1/20 0.34
HPGD P15428 1/20 0.34
GAA P10253 1/20 0.34
SMN1; SMN2 Q16637 2/20 0.33
MAPK1 P28482 1/20 0.33
DRD2 P14416 2/20 0.33
LMNA P02545 1/20 0.33
DRD1 P21728 1/20 0.32
DRD4 P21917 1/20 0.32
DRD5 P21918 1/20 0.32
DRD3 P35462 1/20 0.32
TDP1 Q9NUW8 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL926997 0.81 MAPT (0.42) HSD11B1KDM4EMAPTALDH1A1HSD17B10
SCHEMBL7889107 0.80 STS (0.43) HSD11B1CXCR2CXCR1KDM4EMAPT
SCHEMBL31462445 0.79 L3MBTL1 (0.39) HSD11B1KDM4EMAPTALDH1A1HSD17B10
SCHEMBL7318290 0.79 MAPT (0.51) HSD11B1CXCR2CXCR1MAPTCYP2C19
SCHEMBL3493018 0.77 HSD11B1 (0.46) HSD11B1MAPTALDH1A1CYP2C19SMN1; SMN2
SCHEMBL25839257 0.77 HSD11B1 (0.46) HSD11B1CXCR2CXCR1KDM4EMAPT
SCHEMBL3494879 0.77 HSD11B1 (0.46) HSD11B1CXCR2ALDH1A1SMN1; SMN2MAPK1
SCHEMBL1056743 0.77 HSD11B1 (0.43) HSD11B1CXCR2CXCR1KDM4EMAPT
SCHEMBL5702433 0.77 HSD17B10 (0.43) KDM4EMAPTALDH1A1HSD17B10CYP2C19
SCHEMBL12033500 0.77 HSD11B1 (0.41) HSD11B1MAPTGAADRD2DRD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0704762-B1 Resist material and pattern formation WAKO PURE CHEM IND LTD (JP) 1999-12-15 EP disclosed
US-5558971-A HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1996-09-24 US disclosed
US-5558976-A HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1996-09-24 US disclosed
EP-0704762-A1 Resist material and pattern formation WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1996-04-03 EP disclosed