SCHEMBL8462385

SCHEMBL8462385

C/C(=C\c1cccc(O)c1)C(N)=O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC9A1 P19634 1/20 0.54
SLC9A3 P48764 1/20 0.54
SLC9A2 Q9UBY0 1/20 0.54
KDM4E B2RXH2 1/20 0.49
CCNB2 O95067 1/20 0.44
CDK1 P06493 1/20 0.44
CDK4 P11802 1/20 0.44
CCNB1 P14635 1/20 0.44
CCND1 P24385 1/20 0.44
CCNB3 Q8WWL7 1/20 0.44
CYP3A4 P08684 1/20 0.44
AKR1C3 P42330 2/20 0.44
LCK P06239 2/20 0.44
PARP1 P09874 1/20 0.44
GFER P55789 1/20 0.44
FBP1 P09467 1/20 0.41
ABL1 P00519 1/20 0.41
BCR P11274 1/20 0.41
ALDH1A1 P00352 1/20 0.41
CYP1A2 P05177 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3863126 1.00 SLC9A1 (0.54) SLC9A1SLC9A3SLC9A2KDM4ECCNB2
SCHEMBL1137220 0.84 AKR1C3 (0.66) SLC9A1SLC9A3SLC9A2KDM4ECCNB2
Phenol SCHEMBL29181787 0.84 AKR1C3 (0.60) SLC9A1SLC9A3SLC9A2KDM4EAKR1C3
SCHEMBL1137218 0.84 AKR1C3 (0.66) SLC9A1SLC9A3SLC9A2KDM4ECCNB2
SCHEMBL9065961 0.82 SLC9A1 (0.54) SLC9A1SLC9A3SLC9A2CYP3A4AKR1C3
SCHEMBL9065964 0.82 SLC9A1 (0.54) SLC9A1SLC9A3SLC9A2CYP3A4AKR1C3
Phenol SCHEMBL11889591 0.81 AKR1C3 (0.67) SLC9A1SLC9A3SLC9A2KDM4ECCNB2
SCHEMBL27971737 0.81 FBP1 (0.55) SLC9A1SLC9A3SLC9A2CYP3A4AKR1C3
SCHEMBL30834410 0.81 FBP1 (0.55) SLC9A1SLC9A3SLC9A2CYP3A4AKR1C3
SCHEMBL28498750 0.79 KDM4E (0.46) SLC9A1SLC9A3SLC9A2KDM4ECCNB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0919013-A1 ANTIREFLECTIVE COATINGS FOR PHOTORESIST COMPOSITIONS CLARIANT INTERNATIONAL LTD. (CH) 1999-06-02 EP disclosed
WO-1998007070-A1 ANTIREFLECTIVE COATINGS FOR PHOTORESIST COMPOSITIONS CLARIANT INTERNATIONAL, LTD. (CH) 1998-02-19 WO disclosed
EP-0212440-B1 RADIATION-SENSITIVE COMPOSITION, REGISTRATION MATERIAL CONTAINING SUCH A COMPOSITION AND PROCESS FOR THE PRODUCTION OF RELIEF IMAGES HOECHST AKTIENGESELLSCHAFT (DE) 1990-06-13 EP disclosed
US-4822719-A Radiation-sensitive mixture, radiation-sensitive recording material containing said mixture, and process for preparing relief images HOECHST AKTIENGESELLSCHAFT (DE) 1989-04-18 US disclosed
EP-0212440-A2 Radiation-sensitive composition, registration material containing such a composition and process for the production of relief images HOECHST AKTIENGESELLSCHAFT (DE) 1987-03-04 EP disclosed