SCHEMBL8468617

SCHEMBL8468617

CC(c1ccc(OCCC2OCCCO2)cc1)(c1ccc(OCCC2OCCCO2)cc1)c1ccc(OCCC2OCCCO2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PSMB1 P20618 2/20 0.44
PSMB5 P28074 2/20 0.44
PSMB2 P49721 2/20 0.44
KDM4E B2RXH2 2/20 0.43
HRH3 Q9Y5N1 6/20 0.43
MEN1 O00255 4/20 0.42
KMT2A Q03164 4/20 0.42
TP53 P04637 2/20 0.42
MAPT P10636 2/20 0.42
HPGD P15428 2/20 0.42
TSHR P16473 2/20 0.42
ALDH1A1 P00352 2/20 0.42
CYP1A2 P05177 1/20 0.42
PPARG P37231 1/20 0.42
HIF1A Q16665 1/20 0.42
MAOB P27338 4/20 0.41
ALDH2 P05091 1/20 0.41
MAOA P21397 1/20 0.41
CYP3A4 P08684 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8466851 0.94 MEN1 (0.44) PSMB1PSMB5PSMB2KDM4EHRH3
SCHEMBL11937214 0.84 RAB9A (0.49) KDM4EHRH3MEN1KMT2ATP53
SCHEMBL13645865 0.83 KDM4E (0.45) KDM4EHRH3MEN1KMT2ATSHR
SCHEMBL8810213 0.80 NFE2L2 (0.57) MEN1KMT2AMAPTHPGDTSHR
SCHEMBL696146 0.77 FFAR1 (0.47) KDM4EHRH3MAPTALDH1A1PPARG
SCHEMBL8845184 0.77 CHRNB2 (0.45) HRH3MEN1KMT2AMAPTHPGD
SCHEMBL3170367 0.76 ALDH2 (0.41) HRH3MEN1KMT2AHPGDALDH1A1
SCHEMBL13092734 0.76 ALDH2 (0.46) MEN1KMT2AMAPTHPGDALDH1A1
SCHEMBL8844957 0.76 ALDH1A1 (0.47) KDM4EMEN1KMT2AMAPTHPGD
SCHEMBL17356543 0.75 ALDH1A1 (0.68) PSMB1PSMB5PSMB2KDM4EHRH3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-10182537-A None JP disclosed
US-5916995-A Acetal-substituted aromatic hydroxy compounds and negative photoresist compositions comprising the same KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 1999-06-29 US disclosed