SCHEMBL8517895

SCHEMBL8517895

C=COCCOc1ccc(C=CC=Cc2ccc(O)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.48
CHRNB2 P17787 2/20 0.48
CHRNB4 P30926 2/20 0.48
CHRNA3 P32297 2/20 0.48
CHRNA7 P36544 2/20 0.48
CHRNA4 P43681 2/20 0.48
ABCG2 Q9UNQ0 3/20 0.45
STAT3 P40763 1/20 0.41
KDM4E B2RXH2 1/20 0.41
ALDH1A1 P00352 1/20 0.41
MAPT P10636 1/20 0.41
MAOB P27338 1/20 0.40
LTA4H P09960 3/20 0.40
SLC5A1 P13866 1/20 0.40
SLC5A2 P31639 1/20 0.40
NR5A1 Q13285 1/20 0.40
ALB P02768 1/20 0.40
PTGS1 P23219 1/20 0.39
PTGS2 P35354 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2447907 0.94 CHRNB2 (0.54) APPCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL2449737 0.88 LTA4H (0.48) APPCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL2454363 0.83 LTA4H (0.44) APPCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL16134421 0.79 ALDH1A1 (0.39) APPCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL419937 0.79 THRB (0.41) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL7702904 0.78 APP (0.55) APPCHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL10766999 0.78 F3 (0.51) ABCG2SLC5A1SLC5A2
SCHEMBL8905871 0.78 CHRNA7 (0.54) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL2449215 0.78 KDM4E (0.43) KDM4EALDH1A1MAPTLTA4HNR5A1
SCHEMBL7270952 0.77 CHRNB2 (0.50) APPCHRNB2CHRNB4CHRNA3CHRNA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0675410-B1 Resist composition for deep ultraviolet light WAKO PURE CHEM IND LTD (JP) 1999-08-04 EP disclosed
EP-0675410-A1 Resist composition for deep ultraviolet light WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1995-10-04 EP disclosed