SCHEMBL8522339

SCHEMBL8522339

C=Cc1ccc(C(O)C(=O)Oc2ccc(C=CC=Cc3ccc(OC(C)OC)cc3)cc2)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.35
KDM4E B2RXH2 1/20 0.35
MEN1 O00255 1/20 0.35
TTR P02766 1/20 0.35
TP53 P04637 1/20 0.35
CYP3A4 P08684 1/20 0.35
MAPT P10636 1/20 0.35
KMT2A Q03164 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
TAS1R3 Q7RTX0 2/20 0.34
TAS1R1 Q7RTX1 2/20 0.34
STAT3 P40763 1/20 0.34
HDAC8 Q9BY41 1/20 0.34
HDAC6 Q9UBN7 1/20 0.34
TDP1 Q9NUW8 1/20 0.33
LTB4R Q15722 1/20 0.32
LTB4R2 Q9NPC1 1/20 0.32
MAOB P27338 2/20 0.32
F3 P13726 1/20 0.32
ELANE P08246 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6427959 0.89 PTGS2 (0.38) LMNAKDM4EMEN1TTRTP53
SCHEMBL6427652 0.84 PPARG (0.38) LMNALTB4RLTB4R2MAOBCYP1A2
SCHEMBL6278668 0.82 CYP3A4 (0.35) LMNAKDM4ETTRTP53CYP3A4
SCHEMBL4968186 0.82 PTGS2 (0.36) LMNASMN1; SMN2TAS1R3TAS1R1LTB4R
SCHEMBL8521643 0.81 ELANE (0.35) LMNAKDM4EMEN1TTRTP53
SCHEMBL7271956 0.80 SMN1; SMN2 (0.32) LMNAKDM4EMEN1TTRTP53
SCHEMBL5707357 0.79 KDM4E (0.35) LMNAKDM4EMEN1TTRTP53
SCHEMBL6550374 0.78 ABCB11 (0.33) CYP3A4MAPTTAS1R3TAS1R1STAT3
SCHEMBL6536741 0.77 LMNA (0.40) LMNAMAPTELANECYP1A2
SCHEMBL8521546 0.77 ELANE (0.40) KDM4EMEN1TTRMAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0704762-B1 Resist material and pattern formation WAKO PURE CHEM IND LTD (JP) 1999-12-15 EP disclosed
US-5558971-A HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1996-09-24 US disclosed
US-5558976-A HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1996-09-24 US disclosed
EP-0704762-A1 Resist material and pattern formation WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1996-04-03 EP disclosed