SCHEMBL6536741

SCHEMBL6536741

C=Cc1ccc(OC(=O)C(O)c2ccc(C=C)cc2)cc1.C=Cc1ccc(OC(C)OCc2ccccc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
ALOX5 P09917 1/20 0.38
CNR2 P34972 1/20 0.37
PPARG P37231 2/20 0.36
PPARA Q07869 2/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2C19 P33261 1/20 0.36
NR1H4 Q96RI1 1/20 0.36
ATM Q13315 1/20 0.35
MAPT P10636 1/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
ACHE P22303 1/20 0.35
AAK1 Q2M2I8 1/20 0.35
ELANE P08246 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6427652 0.95 PPARG (0.38) LMNAL3MBTL1ALOX5CNR2PPARG
SCHEMBL4968186 0.85 PTGS2 (0.36) LMNAL3MBTL1ACHEELANE
SCHEMBL2973189 0.85 LCK (0.39) LMNAL3MBTL1PPARGPPARACYP1A2
SCHEMBL6427959 0.80 PTGS2 (0.38) LMNAPPARGPPARAMAPTNPC1
SCHEMBL4967303 0.79 ABCG2 (0.40) LMNAPPARGPPARACYP1A2CYP2C19
SCHEMBL8522339 0.77 LMNA (0.35) LMNACYP1A2MAPTELANE
SCHEMBL13469001 0.76 ADRB2 (0.35) ALOX5CYP1A2MAPTNPC1RAB9A
SCHEMBL1356988 0.75 MAOB (0.46) AAK1
SCHEMBL10170753 0.73 IDO1 (0.44) LMNAL3MBTL1ALOX5CNR2MAPT
SCHEMBL685739 0.72 PPARG (0.38) L3MBTL1PPARGPPARANPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6756179-B2 A POSITIVE RESIST COMPRISING: A RESIN CAPABLE OF DECOMPOSING BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPER, AND A COMPOUND CAPABLE OF GENERATING AROMATIC SULFONIC ACID SUBSTITUTED WITH A FLUORINE CONTAINING GROUP FUJI PHOTO FILM CO., LTD. (JP) 2004-06-29 US disclosed
US-20020058200-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2002-05-16 US disclosed