SCHEMBL8530966

SCHEMBL8530966

COC(=O)CCN(CCCCCCN(CCC(=O)OC)C1CC(C)(C)N(O)C(C)(C)C1)C1CC(C)(C)N(O)C(C)(C)C1

nearest known ligand 0.37

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
KDM5A P29375 2/20 0.35
TSHR P16473 3/20 0.34
EPHX2 P34913 3/20 0.34
ALDH1A1 P00352 3/20 0.34
ALOX15 P16050 1/20 0.34
GLA P06280 1/20 0.33
LMNA P02545 1/20 0.30
GAA P10253 1/20 0.30
HTT P42858 1/20 0.30
FPR3 P25089 1/20 0.30
FPR2 P25090 1/20 0.30
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8536148 0.89 KDM5A (0.37) MEN1KMT2AKDM5ATSHREPHX2
SCHEMBL8433528 0.82 MEN1 (0.38) MEN1KMT2AKDM5ATSHREPHX2
SCHEMBL8533073 0.80 KDM5A (0.39) MEN1KMT2AKDM5AEPHX2
SCHEMBL8949243 0.78 MEN1 (0.33) MEN1KMT2AGAA
SCHEMBL16175981 0.74 EPHX2 (0.38) KMT2ATSHREPHX2ALDH1A1ALOX15
SCHEMBL8532386 0.74 MEN1 (0.41) MEN1KMT2ATSHREPHX2ALOX15
SCHEMBL7881742 0.74 NAAA (0.44) MEN1KMT2ATSHREPHX2ALDH1A1
SCHEMBL7873164 0.74 NAAA (0.44) MEN1KMT2ATSHREPHX2ALDH1A1
SCHEMBL7877422 0.74 NAAA (0.44) MEN1KMT2ATSHREPHX2ALDH1A1
SCHEMBL7881753 0.72 SMN1; SMN2 (0.44) MEN1KMT2ATSHREPHX2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5714612-A LIGHT STABILIZATION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1998-02-03 US disclosed
US-5506286-A BLENDING STABILZER WITH SYNTHETIC RESINS, RUBBERS, PAINTS, OILS TO STABILIZE FROM PHOTOOXIDATION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1996-04-09 US disclosed
US-5384348-A Improved photostability for polymers, weather resistance SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1995-01-24 US disclosed