SCHEMBL8530981

SCHEMBL8530981

Cc1cc(O)ccc1S(=O)(=O)c1ccccc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 4/20 0.64
GAA P10253 3/20 0.64
GFER P55789 1/20 0.64
CYTH2 Q99418 1/20 0.56
ATM Q13315 2/20 0.50
ERAP1 Q9NZ08 2/20 0.50
TDP1 Q9NUW8 1/20 0.50
ABCC9 O60706 1/20 0.50
ABCC8 Q09428 1/20 0.50
KCNJ11 Q14654 1/20 0.50
KCNJ8 Q15842 1/20 0.50
ALDH1A1 P00352 2/20 0.49
PKM P14618 1/20 0.49
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
RAPGEF4 Q8WZA2 1/20 0.46
ESR2 Q92731 1/20 0.46
HSD11B1 P28845 1/20 0.45
HTR6 P50406 5/20 0.45
MAPT P10636 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8493837 0.89 RAPGEF4 (0.58) POLBGAAGFERCYTH2ATM
SCHEMBL17365926 0.86 CYTH2 (0.56) POLBGAAGFERCYTH2ATM
SCHEMBL7875384 0.85 GAA (0.49) POLBGAAGFERCYTH2TDP1
SCHEMBL9659703 0.82 CYP1A2 (0.53) ALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL2487383 0.81 ALDH1A1 (0.54) POLBGAAGFERABCC9ABCC8
SCHEMBL30513963 0.81 ALDH1A1 (0.54) POLBGAAGFERABCC9ABCC8
SCHEMBL979753 0.81 POLB (0.73) POLBGAAGFERATMERAP1
SCHEMBL4400959 0.81 HTR6 (0.56) POLBGAAGFERABCC9ABCC8
SCHEMBL9662387 0.80 GAA (0.65) GAACYTH2ALDH1A1PKMMEN1
SCHEMBL10788994 0.80 POLB (0.56) POLBGAAGFERCYTH2ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP claimed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP claimed
CN-113646052-B Reversible thermochromic composition, reversible thermochromic microcapsule pigment, and writing instrument 百乐墨水株式会社 2024-05-17 CN disclosed
CN-117098671-A Compositions and methods for sensitizing thermal media 索理思科技开曼公司 2023-11-21 CN disclosed
CN-113785023-B Water-based ink composition for reversible thermochromic writing instrument, refill for refill and water-based ballpoint pen incorporating same 株式会社百乐 2023-05-12 CN disclosed
CN-114667279-A Heat-sensitive recording material containing non-phenol color developer 索理思科技开曼公司 2022-06-24 CN disclosed
CN-110234515-B Recording material and recording sheet 日本曹达株式会社 2022-02-11 CN disclosed
CN-113785023-A Water-based ink composition for reversible thermal discoloration writing instrument, refill containing the same, and water-based ballpoint pen 株式会社百乐 2021-12-10 CN disclosed
CN-113646052-A Reversible thermal discoloration composition, reversible thermal discoloration microcapsule pigment encapsulating the reversible thermal discoloration composition, and writing instrument using the reversible thermal discoloration microcapsule pigment 百乐墨水株式会社 2021-11-12 CN disclosed
CN-110709255-B Recording material and compound 日本曹达株式会社 2021-08-06 CN disclosed
CN-109641472-B Recording material and recording sheet 日本曹达株式会社 2021-07-27 CN disclosed
WO-2020209118-A1 REVERSIBLY THERMOCHROMIC AQUEOUS INK COMPOSITION FOR WRITING UTENSILS, AND REFILL AND WATER-BASED BALLPOINT PEN EACH INTERNALLY CONTAINING SAME 株式会社パイロットコーポレーション 2020-10-15 WO disclosed
WO-2020203603-A1 REVERSIBLE THERMOCHROMIC COMPOSITION, REVERSIBLE THERMOCHROMIC MICROCAPSULE PIGMENT COMPRISING SAME, AND WRITING INSTRUMENT USING SAME パイロットインキ株式会社 2020-10-08 WO disclosed
CN-110709255-A Recording material and compound 日本曹达株式会社 2020-01-17 CN disclosed
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed