SCHEMBL8537202

SCHEMBL8537202

C=C(C)C(=O)OCCNC(=O)Nc1ccc(-c2ccc(NC(=O)NCCOC(=O)C(=C)C)c(N)c2)cc1N

nearest known ligand 0.41

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
AAK1 Q2M2I8 6/20 0.41
MAPT P10636 1/20 0.39
HDAC3 O15379 3/20 0.38
HDAC1 Q13547 3/20 0.38
HDAC2 Q92769 3/20 0.38
ABCB1 P08183 2/20 0.37
ABCC1 P33527 2/20 0.36
LMNA P02545 2/20 0.36
PTGER4 P35408 2/20 0.34
POLB P06746 1/20 0.34
APEX1 P27695 1/20 0.34
HTT P42858 1/20 0.34
TDP1 Q9NUW8 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8541147 0.95 HDAC1 (0.45) AAK1HDAC3HDAC1HDAC2
SCHEMBL8537207 0.84 HDAC3 (0.37) MAPTHDAC3HDAC1HDAC2LMNA
SCHEMBL8539871 0.81 KMT2A (0.43) MAPTABCB1ABCC1LMNAPOLB
SCHEMBL3251760 0.79 HDAC1 (0.54) HDAC3HDAC1HDAC2
SCHEMBL10093576 0.77 RXFP1 (0.46) MAPTPOLB
SCHEMBL3253121 0.76 ITGB3 (0.57) MAPTPOLB
SCHEMBL3252701 0.76 MARS1 (0.44) MAPTLMNAPOLBHTTTDP1
SCHEMBL3254727 0.76 GAA (0.43) MAPTPOLBHTT
SCHEMBL10093529 0.76 EPHX1 (0.40) MAPTLMNAPOLBAPEX1HTT
SCHEMBL28528447 0.76 DDX3X (0.52) MAPTHDAC3HDAC1HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5847071-A Photosensitive resin composition HITACHI, CHEMICAL CO., LTD. (JP) 1998-12-08 US disclosed
US-5668248-A POLYAMIC ACID ESTERS HITACHI CHEMICAL CO., LTD. (JP) 1997-09-16 US disclosed
US-5472823-A Polyamic acids HITACHI CHEMICAL CO., LTD. (JP) 1995-12-05 US disclosed