Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.30 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL824303 | 0.88 | ALDH1A1 (0.36) | ALDH1A1EPHX2 | |
| SCHEMBL12705280 | 0.88 | ALDH1A1 (0.33) | ALDH1A1EPHX2 | |
| SCHEMBL2611763 | 0.88 | EPHX2 (0.31) | EPHX2 | |
| SCHEMBL12705265 | 0.87 | ALDH1A1 (0.34) | ALDH1A1EPHX2 | |
| SCHEMBL19418035 | 0.86 | — | — | |
| SCHEMBL9608680 | 0.85 | ALDH1A1 (0.33) | ALDH1A1CYP17A1CYP19A1 | |
| SCHEMBL12705288 | 0.85 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL853456 | 0.84 | EPHX2 (0.33) | ALDH1A1EPHX2CYP17A1CYP19A1 | |
| SCHEMBL19261184 | 0.84 | ALDH1A1 (0.35) | ALDH1A1EPHX2 | |
| SCHEMBL949011 | 0.83 | EPHX2 (0.33) | ALDH1A1EPHX2CYP17A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8324331-B2 | Fluorine-containing compound and polymeric compound | DAITO CHEMIX CORPORATION (JP) | 2012-12-04 | — | — | US | disclosed |
| US-8263307-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-09-11 | — | — | US | disclosed |
| US-20120077125-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-03-29 | — | — | US | disclosed |
| US-8142979-B2 | Resist composition for immersion exposure and method of forming resist pattern using the same | Tokyo Ohka Tokyo Co., Ltd. (JP) | 2012-03-27 | — | — | US | disclosed |
| US-8021823-B2 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-09-20 | — | — | US | disclosed |
| US-7989138-B2 | Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-08-02 | — | — | US | disclosed |
| US-20100168358-A1 | FLUORINE-CONTAINING COMPOUND AND POLYMERIC COMPOUND | DAITO CHEMIX CORPORATION (JP) | 2010-07-01 | — | — | US | disclosed |
| US-20090311627-A1 | Resist composition for immersion exposure and method of forming resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. | 2009-12-17 | — | — | US | disclosed |
| US-20090269701-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090214982-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-08-27 | — | — | US | disclosed |
| US-20090162788-A1 | NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-06-25 | — | — | US | disclosed |
| US-20090142699-A1 | FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPOSURE, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-06-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100168358-A1 | FLUORINE-CONTAINING COMPOUND AND POLYMERIC COMPOUND | AFF1, AFF2, FLI1 | ALDH1A1 1407/4885EPHX2 4018/4885CYP17A1 1742/4885 |
| US-20090162788-A1 | NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | RER1, ASIC1, GLRA1 | ALDH1A1 987/4885EPHX2 252/4885CYP17A1 559/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.