Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 1/20 | 0.45 |
| ▸ | CA1 | P00915 | 1/20 | 0.45 |
| ▸ | CA2 | P00918 | 1/20 | 0.45 |
| ▸ | CA9 | Q16790 | 1/20 | 0.45 |
| ▸ | GRIN2D | O15399 | 4/20 | 0.44 |
| ▸ | GRIN3B | O60391 | 4/20 | 0.44 |
| ▸ | GRIN1 | Q05586 | 4/20 | 0.44 |
| ▸ | GRIN2A | Q12879 | 4/20 | 0.44 |
| ▸ | GRIN2B | Q13224 | 4/20 | 0.44 |
| ▸ | GRIN2C | Q14957 | 4/20 | 0.44 |
| ▸ | GRIN3A | Q8TCU5 | 4/20 | 0.44 |
| ▸ | GBA2 | Q9HCG7 | 10/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | GBA1 | P04062 | 5/20 | 0.37 |
| ▸ | UGCG | Q16739 | 4/20 | 0.36 |
| ▸ | MGAM | O43451 | 1/20 | 0.36 |
| ▸ | LCT | P09848 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5095244 | 0.87 | GRIN2D (0.50) | CA12CA1CA2CA9GRIN2D | |
| SCHEMBL14947973 | 0.86 | GAA (0.37) | CA12CA1CA2CA9GRIN2D | |
| SCHEMBL12511153 | 0.84 | GBA2 (0.44) | CA12CA1CA2CA9GRIN2D | |
| SCHEMBL3913351 | 0.80 | CA12 (0.45) | CA12CA1CA2CA9GRIN2D | |
| SCHEMBL13998865 | 0.79 | MEN1 (0.51) | CA12CA1CA2CA9GRIN2D | |
| SCHEMBL4808151 | 0.79 | GBA2 (0.38) | CA12CA1CA2CA9GRIN2D | |
| SCHEMBL92293 | 0.78 | ALDH1A1 (0.47) | CA12CA1CA2CA9GRIN2D | |
| SCHEMBL919840 | 0.78 | CA12 (0.44) | CA12CA1CA2CA9GRIN2D | |
| SCHEMBL13998861 | 0.78 | PKM (0.41) | CA12CA1CA2CA9ALDH1A1 | |
| SCHEMBL20612578 | 0.77 | CA12 (0.47) | CA12CA1CA2CA9GRIN2D |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9017918-B2 | Monomer, polymer, chemically amplified positive resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-8889333-B2 | Salt, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8889333-B2 | Salt, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-11-18 | — | — | US | disclosed |
| EP-2433972-B1 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2014-11-12 | — | — | EP | disclosed |
| EP-2433972-B1 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2014-11-12 | — | — | EP | disclosed |
| US-8741541-B2 | Compound, resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8741541-B2 | Compound, resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-06-03 | — | — | US | disclosed |
| EP-1717261-B1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2014-01-01 | — | — | EP | disclosed |
| EP-1717261-B1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2014-01-01 | — | — | EP | disclosed |
| US-20130122424-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-05-16 | — | — | US | disclosed |
| CN-1993393-A | Fluorine-containing compound, fluorine-containing polymer, resist composition, and resist protective film composition | ASAHI GLASS CO LTD (JP) | 2007-07-04 | — | — | CN | disclosed |
| US-7211366-B2 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-05-01 | — | — | US | disclosed |
| EP-1717261-A1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-11-02 | — | — | EP | disclosed |
| CN-1826358-A | Fluorine-containing compound, fluorine-containing polymer, method for producing the same, and resist composition containing the same | ASAHI GLASS CO LTD (JP) | 2006-08-30 | — | — | CN | disclosed |
| WO-2005118656-A2 | PHOTORESISTS COMPRISING POLYMERS DERIVED FROM FLUOROALCOHOL-SUBSTITUTED POLYCYCLIC MONOMERS | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-12-15 | — | — | WO | disclosed |
| EP-1602011-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | AZ Electronic Materials USA Corp. (US) | 2005-12-07 | — | — | EP | disclosed |
| US-20050004391-A1 | Adamantyl vinyl ether compound and production process for the same | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 2005-01-06 | — | — | US | disclosed |
| EP-1486480-A1 | Adamantyl vinyl ether compound and production process for the same | Idemitsu Petrochemical Co., Ltd. (JP) | 2004-12-15 | — | — | EP | disclosed |
| WO-2004074928-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-09-02 | — | — | WO | disclosed |
| US-20040166433-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2004-08-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050004391-A1 | Adamantyl vinyl ether compound and production process for the same | NOTUM, CYP4A11, CYP4F11 | CA12 2410/4885CA1 1929/4885CA2 3361/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.