SCHEMBL8578656

SCHEMBL8578656

CCOC(=O)C1(O)CC2CCC1C2

nearest known ligand 0.41

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.36
ALDH1A1 P00352 2/20 0.36
CYP3A4 P08684 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
HSD11B1 P28845 1/20 0.35
MAPK1 P28482 1/20 0.34
EPHX2 P34913 8/20 0.33
POLB P06746 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13952831 0.80 F10 (0.37) LMNAALDH1A1CYP3A4CYP2D6CYP2C9
SCHEMBL23827196 0.79 LMNA (0.36) LMNAALDH1A1CYP3A4CYP2D6CYP2C9
SCHEMBL7386383 0.79 LMNA (0.36) LMNAALDH1A1CYP3A4CYP2D6CYP2C9
SCHEMBL21174562 0.76 LMNA (0.34) LMNAALDH1A1CYP3A4CYP2D6CYP2C9
SCHEMBL8316382 0.74 ALDH1A1 (0.36) LMNAALDH1A1CYP3A4CYP2D6CYP2C9
SCHEMBL1634132 0.74 CYP3A4 (0.40) LMNAALDH1A1CYP3A4CYP2D6CYP2C9
SCHEMBL5480009 0.72 ALDH1A1 (0.39) LMNAALDH1A1MAPK1POLB
SCHEMBL8733039 0.72 HSD11B1 (0.37) HSD11B1
SCHEMBL19229938 0.71 MAPK1 (0.33) LMNACYP3A4CYP2D6CYP2C9CYP2C19
SCHEMBL4449262 0.71 HSD11B1 (0.33) ALDH1A1HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1280321-C Photoetch resist copolymer HYNIX SEMICONDUCTOR INC (KR) 2006-10-18 CN claimed
CN-1187495-A Method and apparatus for using argon fluoride photoresist HYUNDAI ELECTRONICS IND (KR) 1998-07-15 CN claimed
CN-102167676-A Salt and photoresist composition comprising the same SUMITOMO CHEMICAL CO 2011-08-31 CN disclosed
CN-101168509-A Polyatomic phenol compound and chemical amplification type photoresist composition containing the same SUMITOMO CHEMICAL CO (JP) 2008-04-30 CN disclosed
CN-100354257-C Sulfonate and a resist composition SUMITOMO CHEMICAL CO (JP) 2007-12-12 CN disclosed
CN-1280321-C Photoetch resist copolymer HYNIX SEMICONDUCTOR INC (KR) 2006-10-18 CN disclosed
CN-1576272-A Sulfonate and a resist composition SUMITOMO CHEMICAL CO (JP) 2005-02-09 CN disclosed
CN-1478800-A Photoetch resist copolymer ����ʿ�뵼�����޹�˾ 2004-03-03 CN disclosed
CN-1187495-A Method and apparatus for using argon fluoride photoresist HYUNDAI ELECTRONICS IND (KR) 1998-07-15 CN disclosed
US-5719310-A PESTICIDES BAYER AKTIENGESELLSCHAFT (DE) 1998-02-17 US disclosed
US-5610122-A PESTICIDES BAYER AKTIENGESELLSCHAFT (DE) 1997-03-11 US disclosed