Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3618326 | 0.96 | RAB9A (0.43) | RAB9ALMNACYP1A2CYP2C9 | |
| SCHEMBL30843939 | 0.96 | RAB9A (0.43) | RAB9ALMNACYP1A2CYP2C9 | |
| SCHEMBL29409450 | 0.96 | RAB9A (0.43) | RAB9ALMNACYP1A2CYP2C9 | |
| SCHEMBL11573275 | 0.92 | — | — | |
| SCHEMBL5167023 | 0.87 | — | — | |
| SCHEMBL55920 | 0.87 | — | — | |
| SCHEMBL54883 | 0.84 | — | — | |
| SCHEMBL6246782 | 0.84 | — | — | |
| SCHEMBL9015838 | 0.84 | PTPN7 (0.48) | RAB9ALMNA | |
| SCHEMBL15847476 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 153 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9568821-B2 | Patterning process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-02-14 | — | — | US | claimed |
| US-9507262-B2 | Resist top-coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-29 | — | — | US | claimed |
| US-20150234278-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-20 | — | — | US | claimed |
| US-20150234274-A1 | RESIST TOP-COAT COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-20 | — | — | US | claimed |
| US-12590219-B2 | Phenol compound, conductive paste composition, method for producing conductive paste composition, conductive wire, and method for producing conductive wire | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-31 | — | — | US | disclosed |
| EP-4654222-A1 | DEEP EUTECTIC LIQUID, BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR PRODUCING BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-26 | — | — | EP | disclosed |
| US-20250353969-A1 | Deep Eutectic Liquid, Bio-Electrode Composition, Bio-Electrode, And Method For Producing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| US-20250352110-A1 | BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR PRODUCING BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-4651157-A1 | BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR PRODUCING BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| EP-4492406-B1 | BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING BIO-ELECTRODE | SHINETSU CHEMICAL CO (JP) | 2025-11-19 | — | — | EP | disclosed |
| US-20250345035-A1 | ULTRASONIC COUPLING MATERIAL COMPOSITE FILM AND ULTRASONIC INSPECTION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-13 | — | — | US | disclosed |
| EP-4647466-A1 | ULTRASONIC COUPLING MATERIAL COMPOSITE FILM AND UNLTRASONIC INSPECTION METHOD | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-11-12 | — | — | EP | disclosed |
| US-20180072930-A1 | ADHESIVE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING A BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-15 | — | — | US | disclosed |
| US-9568821-B2 | Patterning process | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-02-14 | — | — | US | disclosed |
| US-9507262-B2 | Resist top-coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-29 | — | — | US | disclosed |
| US-20150234278-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-20 | — | — | US | disclosed |
| US-20150234274-A1 | RESIST TOP-COAT COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-08-20 | — | — | US | disclosed |
| EP-2718016-A1 | NEW COMPLEXES OF RUTHENIUM, METHOD FOR THEIR PREPARATION, AND THEIR APPLICATION IN OLEFIN METATHESIS REACTIONS | Umicore AG & Co. KG (DE) | 2014-04-16 | — | — | EP | disclosed |
| WO-2012168183-A1 | NEW COMPLEXES OF RUTHENIUM, METHOD FOR THEIR PREPARATION, AND THEIR APPLICATION IN OLEFIN METATHESIS REACTIONS | UMICORE AG & CO. KG (DE) | 2012-12-13 | — | — | WO | disclosed |
| WO-1998041530-A1 | TRANSITION METAL METALLACYCLOPENTADIENYL COMPOUNDS | EXXON CHEMICAL PATENTS INC. (US) | 1998-09-24 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12590219-B2 | Phenol compound, conductive paste composition, method for producing conductive paste composition, conductive wire, and method for producing conductive wire | PYCARD, NPR1, TNNC1 | RAB9A 4784/4885LMNA 922/4885CYP1A2 259/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.