Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13288260 | 0.90 | LMNA (0.33) | LMNAHPGDSMN1; SMN2ALDH1A1 | |
| SCHEMBL15836467 | 0.89 | LMNA (0.32) | LMNAHPGDSMN1; SMN2ALDH1A1 | |
| SCHEMBL10049071 | 0.83 | ALDH1A1 (0.37) | LMNAHPGDSMN1; SMN2ALDH1A1 | |
| SCHEMBL85908 | 0.81 | — | — | |
| SCHEMBL11294328 | 0.81 | ALDH1A1 (0.38) | LMNAHPGDSMN1; SMN2ALDH1A1 | |
| SCHEMBL108133 | 0.80 | ALDH1A1 (0.33) | LMNAHPGDSMN1; SMN2ALDH1A1 | |
| SCHEMBL75363 | 0.79 | LMNA (0.34) | LMNAHPGDSMN1; SMN2ALDH1A1 | |
| SCHEMBL9610652 | 0.78 | LMNA (0.33) | LMNAHPGDSMN1; SMN2ALDH1A1 | |
| SCHEMBL12309109 | 0.78 | — | — | |
| SCHEMBL2121091 | 0.78 | LMNA (0.35) | LMNAHPGDSMN1; SMN2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2414896-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2020-11-11 | — | — | EP | disclosed |
| US-9201300-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-01 | — | — | US | disclosed |
| US-8846290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| US-8846290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-09-30 | — | — | US | disclosed |
| US-8835098-B2 | Method of forming pattern | FUJIFILM CORPORATION (JP) | 2014-09-16 | — | — | US | disclosed |
| US-8835098-B2 | Method of forming pattern | FUJIFILM CORPORATION (JP) | 2014-09-16 | — | — | US | disclosed |
| US-20140178818-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-8574813-B2 | Resist composition for immersion exposure and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8574813-B2 | Resist composition for immersion exposure and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20130209938-A1 | Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same | CENTRAL GLASS COMPANY, LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| US-20100204422-A1 | Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | disclosed |
| US-7736835-B2 | Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-06-15 | — | — | US | disclosed |
| US-7736835-B2 | Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-06-15 | — | — | US | disclosed |
| US-20090208886-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090053650-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-20090042132-A1 | RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-12 | — | — | US | disclosed |
| US-7402626-B2 | Top coat composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-07-22 | — | — | US | disclosed |
| US-7402626-B2 | Top coat composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-07-22 | — | — | US | disclosed |
| US-20080003517-A1 | Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-01-03 | — | — | US | disclosed |
| US-20080003517-A1 | Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-01-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100204422-A1 | Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern | AFF1, AFF2, FGFR1 | LMNA 3016/4885HPGD 4336/4885SMN1; SMN2 1646/4885 |
| US-20080003517-A1 | Fluorine-Containing Cyclic Compound, Fluorine-Containing Polymer Compound, Resist Material Using Same and Method for Forming Pattern | AFF1, AFF2, FGFR1 | LMNA 3016/4885HPGD 4336/4885SMN1; SMN2 1646/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.