SCHEMBL8600643

SCHEMBL8600643

CCN(CC)c1ccc(N2CC=CN2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.41
KMT2A Q03164 4/20 0.41
GAA P10253 3/20 0.41
RAB9A P51151 2/20 0.41
ALDH1A1 P00352 13/20 0.40
L3MBTL1 Q9Y468 3/20 0.40
TSHR P16473 2/20 0.40
GFER P55789 2/20 0.40
MAPK1 P28482 2/20 0.40
TDP1 Q9NUW8 2/20 0.40
PSMD14 O00487 1/20 0.40
CYP3A4 P08684 1/20 0.40
RECQL P46063 1/20 0.40
POLB P06746 1/20 0.40
MAPT P10636 9/20 0.39
LMNA P02545 3/20 0.39
SMN1; SMN2 Q16637 3/20 0.39
HTT P42858 2/20 0.39
KDM4E B2RXH2 4/20 0.38
ALDH3A1 P30838 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11401376 0.80
SCHEMBL3384925 0.71 MAPT (0.36) MEN1KMT2AGAARAB9AALDH1A1
SCHEMBL44774 0.70 ALOX5 (0.39) MEN1KMT2AGAARAB9AL3MBTL1
SCHEMBL1735497 0.68 ALDH1A1 (0.74) MEN1KMT2AGAARAB9AALDH1A1
Hydrochloric Acid SCHEMBL8046146 0.66 ALDH1A1 (0.70) MEN1KMT2AGAARAB9AALDH1A1
Hydrochloric Acid SCHEMBL8046149 0.66 ALDH1A1 (0.70) MEN1KMT2AGAARAB9AALDH1A1
SCHEMBL8549911 0.66 ADRB1 (0.56) MEN1KMT2AGAARAB9AALDH1A1
SCHEMBL3382349 0.64 SIRT6 (0.47) MEN1KMT2AALDH1A1POLBMAPT
SCHEMBL1972710 0.64 ALDH1A1 (0.67) MEN1KMT2AGAARAB9AALDH1A1
SCHEMBL332675 0.64 ALDH1A1 (0.67) MEN1KMT2AGAARAB9AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0821279-A1 Electrophotographic photoreceptor and coating solution for production of charge transport layer HITACHI CHEMICAL COMPANY, LTD. (JP) 1998-01-28 EP disclosed
EP-0401782-A2 Titanyl phthalocyanine crystal, method of manufacture thereof and its use for electrophotographic photosensitive material NEC CORPORATION (JP) 1990-12-12 EP disclosed
EP-0368251-A2 Photosensitive material for electrophotography and method for making same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1990-05-16 EP disclosed
EP-0314100-A2 Alpha-type titanyl phthalocyanine composition, method for production thereof, and electrophotographic sensitive material using same MITA INDUSTRIAL CO. LTD. (JP) 1989-05-03 EP disclosed
US-4717636-A Electrophotographic photosensitive member containing polyvinylarylal CANON KABUSHIKI KAISHA (JP) 1988-01-05 US disclosed