SCHEMBL8624374

SCHEMBL8624374

C=C(CCCCCCCCCCCCCBr)C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TBXAS1 P24557 2/20 0.43
LMNA P02545 3/20 0.38
TSHR P16473 1/20 0.38
NFKB1 P19838 1/20 0.38
PMP22 Q01453 1/20 0.38
TET2 Q6N021 3/20 0.33
TET3 O43151 1/20 0.33
TET1 Q8NFU7 1/20 0.33
THRB P10828 1/20 0.33
FNTA P49354 1/20 0.33
FNTB P49356 1/20 0.33
PGGT1B P53609 1/20 0.33
MAPT P10636 2/20 0.32
L3MBTL1 Q9Y468 2/20 0.32
GRIK1 P39086 1/20 0.32
GRIK2 Q13002 1/20 0.32
GRM1 Q13255 1/20 0.32
GRM2 Q14416 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
ABCC4 O15439 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2392849 1.00 TBXAS1 (0.43) TBXAS1LMNATSHRNFKB1PMP22
SCHEMBL982293 1.00 TBXAS1 (0.43) TBXAS1LMNATSHRNFKB1PMP22
SCHEMBL6865805 1.00 TBXAS1 (0.43) TBXAS1LMNATSHRNFKB1PMP22
SCHEMBL6858104 1.00 TBXAS1 (0.43) TBXAS1LMNATSHRNFKB1PMP22
SCHEMBL6862064 1.00 TBXAS1 (0.43) TBXAS1LMNATSHRNFKB1PMP22
SCHEMBL2770074 1.00 TBXAS1 (0.43) TBXAS1LMNATSHRNFKB1PMP22
SCHEMBL6865841 1.00 TBXAS1 (0.43) TBXAS1LMNATSHRNFKB1PMP22
SCHEMBL2008693 0.98 TBXAS1 (0.41) TBXAS1LMNATSHRNFKB1PMP22
SCHEMBL449324 0.90
SCHEMBL1860769 0.87 TBXAS1 (0.50) TBXAS1LMNATSHRNFKB1PMP22

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0476187-B1 A highly photosensitive imaging element based on a photosensitive resin AGFA GEVAERT NV (BE) 1998-05-20 EP disclosed
US-5441731-A A ion exchange resin based on a cationic polymer of an alkyl alkacrylate, a oligoyalkylene glycol dimethacrylate acid and a trialkylammonioalkyl methacrylate; antichloesterol agent SMITHKLINE & FRENCH LABORATORIES LTD. (GB) 1995-08-15 US disclosed
EP-0373852-B1 Compounds SMITH KLINE FRENCH LAB (GB) 1994-10-26 EP disclosed
EP-0476187-A1 A highly photosensitive imaging element based on a photosensitive resin AGFA-GEVAERT N.V. (BE) 1992-03-25 EP disclosed
EP-0373852-A2 Compounds SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) 1990-06-20 EP disclosed