SCHEMBL8632649

SCHEMBL8632649

Nc1ccc(C(=O)Oc2ccccc2N)c(N)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
LMNA P02545 2/20 0.50
TSHR P16473 2/20 0.50
TP53 P04637 1/20 0.50
CYP3A4 P08684 1/20 0.50
ADORA3 P0DMS8 1/20 0.50
CHRM1 P11229 1/20 0.50
TBXA2R P21731 1/20 0.50
SLC6A2 P23975 1/20 0.50
PDE4A P27815 1/20 0.50
ADRA1A P35348 1/20 0.50
KDR P35968 1/20 0.50
SLC6A3 Q01959 1/20 0.50
HDAC6 Q9UBN7 1/20 0.50
ALDH1A1 P00352 9/20 0.43
HSD17B10 Q99714 7/20 0.43
CFTR P13569 1/20 0.43
KDM4E B2RXH2 4/20 0.40
GAA P10253 3/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8629544 0.89 MAPT (0.56) MAPTSMN1; SMN2LMNATSHRTP53
SCHEMBL6430893 0.84 ALDH1A1 (0.60) MAPTSMN1; SMN2LMNATSHRTP53
SCHEMBL8006532 0.80 IDO1 (0.56) MAPTSMN1; SMN2LMNATSHRTP53
SCHEMBL28260593 0.79 HSD17B10 (0.51) MAPTSMN1; SMN2LMNATSHRTP53
SCHEMBL28261900 0.78 MAPT (0.49) MAPTSMN1; SMN2LMNATSHRTP53
SCHEMBL13292734 0.77 SMN1; SMN2 (0.58) MAPTSMN1; SMN2LMNATSHRTP53
SCHEMBL13292735 0.77 SMN1; SMN2 (0.57) MAPTSMN1; SMN2LMNATSHRSLC6A3
SCHEMBL30660134 0.76 MAPT (0.48) MAPTSMN1; SMN2LMNATSHRTP53
SCHEMBL13292725 0.76 SMN1; SMN2 (0.65) MAPTSMN1; SMN2LMNATSHRSLC6A3
SCHEMBL17744884 0.75 ALDH1A1 (0.50) MAPTSMN1; SMN2LMNATSHRTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130237040-A1 RESIN COMPOSITION, LAMINATE AND PROCESS FOR PRODUCTION THEREOF, STRUCTURE AND PROCESS FOR PRODUCTION THEREOF, AND PROCESS FOR PRODUCTION OF ELECTRONIC DEVICE ASAHI GLASS COMPANY, LIMITED (JP) 2013-09-12 US disclosed
US-5747625-A Silicate group-containing polyimide NIPPON STEEL CHEMICAL CO., LTD. (JP) 1998-05-05 US disclosed