Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 3/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15836465 | 0.85 | THRB (0.32) | THRBALDH1A1TSHR | |
| SCHEMBL15134124 | 0.82 | TSHR (0.33) | THRBALDH1A1TSHR | |
| SCHEMBL278099 | 0.80 | ALDH1A1 (0.44) | THRBALDH1A1TSHR | |
| SCHEMBL85919 | 0.79 | ALDH1A1 (0.34) | THRBALDH1A1TSHR | |
| SCHEMBL493762 | 0.73 | TSHR (0.35) | THRBALDH1A1TSHR | |
| SCHEMBL8520342 | 0.73 | ALDH1A1 (0.38) | THRBALDH1A1TSHR | |
| SCHEMBL16291137 | 0.73 | TSHR (0.40) | THRBALDH1A1TSHR | |
| SCHEMBL3817861 | 0.73 | ALDH1A1 (0.38) | THRBALDH1A1TSHR | |
| SCHEMBL18473426 | 0.73 | ALDH1A1 (0.38) | THRBALDH1A1TSHR | |
| SCHEMBL16291366 | 0.73 | TSHR (0.40) | THRBALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9201300-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-01 | — | — | US | disclosed |
| US-20140178818-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-26 | — | — | US | disclosed |
| US-8129099-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20090208886-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |