Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EGFR | P00533 | 1/20 | 0.33 |
| ▸ | SRC | P12931 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | KDM7A | Q6ZMT4 | 1/20 | 0.32 |
| ▸ | PHF8 | Q9UPP1 | 1/20 | 0.32 |
| ▸ | KDM2A | Q9Y2K7 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | TPSAB1 | Q15661 | 2/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8640274 | 0.89 | RECQL (0.37) | KDM7APHF8KDM2ATSHR | |
| SCHEMBL8644278 | 0.83 | MGAM (0.31) | MEN1KMT2A | |
| SCHEMBL4019745 | 0.82 | PHF8 (0.39) | MEN1KMT2APHF8KDM2ATSHR | |
| SCHEMBL24096185 | 0.77 | PHF8 (0.32) | MEN1KMT2APHF8KDM2A | |
| SCHEMBL16050328 | 0.77 | TSHR (0.59) | MEN1KMT2APHF8KDM2ATSHR | |
| SCHEMBL28831979 | 0.74 | PHF8 (0.33) | MEN1KMT2APHF8KDM2ATSHR | |
| SCHEMBL15684245 | 0.74 | PHF8 (0.54) | KDM7APHF8KDM2ATSHRLMNA | |
| SCHEMBL6222620 | 0.74 | ALDH1A1 (0.48) | MEN1KMT2APHF8KDM2ATSHR | |
| SCHEMBL4805008 | 0.74 | — | — | |
| SCHEMBL22205611 | 0.73 | LMNA (0.44) | MEN1KMT2AKDM7APHF8KDM2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0458325-B1 | Negative photosensitive composition and method for forming a resist pattern | MITSUBISHI CHEM CORP (JP) | 1998-08-19 | — | — | EP | disclosed |
| EP-0458325-A1 | Negative photosensitive composition and method for forming a resist pattern | Mitsubishi Chemical Corporation (JP) | 1991-11-27 | — | — | EP | disclosed |