SCHEMBL8640274

SCHEMBL8640274

CONC(=O)CCCCC(=O)N(C)OC

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RECQL P46063 1/20 0.37
KDM5A P29375 3/20 0.33
GAA P10253 1/20 0.33
ALDH1A1 P00352 1/20 0.32
KDM4A O75164 8/20 0.32
KDM4C Q9H3R0 8/20 0.32
POLB P06746 1/20 0.32
POLA1 P09884 1/20 0.32
KDM7A Q6ZMT4 1/20 0.32
PHF8 Q9UPP1 1/20 0.32
KDM2A Q9Y2K7 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
DNM1 Q05193 1/20 0.32
TSHR P16473 2/20 0.32
HDAC3 O15379 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
HDAC8 Q9BY41 1/20 0.31
HDAC6 Q9UBN7 1/20 0.31
HDAC5 Q9UQL6 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8639744 0.89 EGFR (0.33) KDM7APHF8KDM2ATSHR
SCHEMBL24703880 0.84 ALDH1A1 (0.42) KDM5AALDH1A1KDM4AKDM4CKDM7A
SCHEMBL29991123 0.82 ALDH1A1 (0.41) KDM5AALDH1A1KDM4AKDM4CKDM7A
SCHEMBL8644278 0.80 MGAM (0.31) GAA
SCHEMBL22205611 0.80 LMNA (0.44) KDM5AALDH1A1KDM4AKDM4CKDM7A
SCHEMBL13552252 0.76 PAOX (0.41) KDM5AALDH1A1KDM4AKDM4CKDM7A
SCHEMBL499152 0.76 GPR84 (0.39) KDM5AGAAALDH1A1KDM4AKDM4C
SCHEMBL20845950 0.76 CYP1A2 (0.47) RECQLALDH1A1TSHRHDAC3HDAC1
SCHEMBL1713084 0.76 ALDH1A1 (0.52) KDM5AALDH1A1KDM4CPOLBPOLA1
SCHEMBL10499955 0.76 RECQL (0.45) RECQLGAAL3MBTL1TSHRHDAC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0458325-B1 Negative photosensitive composition and method for forming a resist pattern MITSUBISHI CHEM CORP (JP) 1998-08-19 EP disclosed
EP-0458325-A1 Negative photosensitive composition and method for forming a resist pattern Mitsubishi Chemical Corporation (JP) 1991-11-27 EP disclosed
US-4138393-A Crosslinkable acrylonitrile copolymers BAYER AKTIENGESELLSCHAFT (DE) 1979-02-06 US disclosed