Biphenyl

Biphenyl

SCHEMBL864069

ClC(Cl)(Cl)c1ncnc(C(Cl)(Cl)Cl)n1.c1ccc(-c2ccccc2)cc1

nearest known ligand 0.39

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.39
ATM Q13315 1/20 0.38
TSHR P16473 1/20 0.37
SMN1; SMN2 Q16637 3/20 0.37
RAB9A P51151 2/20 0.37
NPC1 O15118 1/20 0.37
NFKB1 P19838 1/20 0.37
NFKB2 Q00653 1/20 0.37
RELA Q04206 1/20 0.37
CYP1A2 P05177 1/20 0.36
NOTUM Q6P988 1/20 0.36
ADORA2A P29274 1/20 0.35
MIF P14174 1/20 0.35
ASIC3 Q9UHC3 1/20 0.35
CCNB2 O95067 1/20 0.35
CCNE2 O96020 1/20 0.35
CDK1 P06493 1/20 0.35
CDK4 P11802 1/20 0.35
CCNB1 P14635 1/20 0.35
CCNA2 P20248 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27689580 0.87 NPC1 (0.39) ALDH1A1SMN1; SMN2RAB9ANPC1NFKB1
SCHEMBL2367747 0.86 NPC1 (0.38) SMN1; SMN2RAB9ANPC1NFKB1NFKB2
SCHEMBL978908 0.83
(Z)-1,2-Diphenylethene SCHEMBL28844913 0.82 KDM4E (0.50) ALDH1A1TSHRSMN1; SMN2RAB9ANPC1
SCHEMBL125466 0.77 MEN1 (0.44) ALDH1A1SMN1; SMN2RAB9ANPC1NFKB1
SCHEMBL4900598 0.76 MEN1 (0.47) ALDH1A1TSHRSMN1; SMN2RAB9ANPC1
SCHEMBL80527 0.76 MEN1 (0.47) ALDH1A1TSHRSMN1; SMN2RAB9ANPC1
SCHEMBL940015 0.72 KDM4E (0.44) ALDH1A1TSHRSMN1; SMN2RAB9ANPC1
SCHEMBL15475691 0.70
SCHEMBL7518324 0.69 MEN1 (0.41) ALDH1A1TSHRSMN1; SMN2RAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 162 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240240024-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, AND COLOR FILTER SAMSUNG SDI CO., LTD. (KR) 2024-07-18 US disclosed
EP-4394001-A1 REACTIVE DYE AND PHOTOSENSITIVE COMPOSITION USING SAME Duksan Neolux Co., Ltd (KR) 2024-07-03 EP disclosed
US-20240199999-A1 THINNER COMPOSITION FOR REMOVING PHOTOSENSITIVE RESIN INCLUDING COLORANT DUK SAN NEOLUX CO., LTD. (KR) 2024-06-20 US disclosed
US-20240206224-A1 METHOD FOR PREPARING PIXEL DEFINE LAYER DUK SAN NEOLUX CO., LTD. (KR) 2024-06-20 US disclosed
US-20240192589-A1 METHOD FOR PREPARING PIXEL DEFINE LAYER DUK SAN NEOLUX CO., LTD. (KR) 2024-06-13 US disclosed
US-20240196661-A1 METHOD FOR PREPARING PIXEL DEFINE LAYER DUK SAN NEOLUX CO., LTD. (KR) 2024-06-13 US disclosed
US-20240192594-A1 METHOD FOR PREPARING PIXEL DEFINE LAYER DUK SAN NEOLUX CO., LTD. (KR) 2024-06-13 US disclosed
US-20240176233-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER SAMSUNG SDI CO., LTD. (KR) 2024-05-30 US disclosed
US-20240179943-A1 METHOD FOR PREPARING PIXEL DEFINE LAYER DUK SAN NEOLUX CO., LTD. (KR) 2024-05-30 US disclosed
US-20240176232-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER SAMSUNG SDI CO., LTD. (KR) 2024-05-30 US disclosed
US-20120145971-A1 Photosensitive Resin Composition and Light Blocking Layer Using the Same CHEIL INDUSTRIES INC. (KR) 2012-06-14 US disclosed
US-20120091407-A1 Photosensitive Resin Composition and Light Blocking Layer Using the Same CHEIL INDUSTRIES INC. (KR) 2012-04-19 US disclosed
US-8158036-B2 Photosensitive resin composition for color filter and color filter using same CHEIL INDUSTRIES INC. (KR) 2012-04-17 US disclosed
US-20120077897-A1 Black Photosensitive Resin Composition and Light Blocking Layer Using the Same CHEIL INDUSTRIES INC. (KR) 2012-03-29 US disclosed
US-20110250531-A1 Photosensitive Resin Composition for Color Filter, and Color Filter Using the Same CHEIL INDUSTRIES INC. (KR) 2011-10-13 US disclosed
WO-2011074752-A1 NOVEL COMPOUND, PIGMENT DISPERSION COMPOSITION AND PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME, AND COLOR FILTER USING THE SAME CHEIL INDUSTRIES INC. (KR) 2011-06-23 WO disclosed
US-20100163811-A1 Organic Layer Photosensitive Resin Composition and Organic Layer Fabricated Using Same CHEIL INDUSTRIES INC. (KR) 2010-07-01 US disclosed
US-20100167188-A1 Pigment Dispersion Composition, Resist Composition for Color Filter Including the Same, and Color Filter Using the Same CHEIL INDUSTRIES INC. (KR) 2010-07-01 US disclosed
US-20100123269-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR IMPRINTING PROCESS AND METHOD FOR FORMING ORGANIC LAYER OVER SUBSTRATE LG DISPLAY CO., LTD. (KR) 2010-05-20 US disclosed
US-20090140220-A1 Photosensitive Resin Composition for Color Filter and Color Filter Using Same CHEIL INDUSTRIES INC. (KR) 2009-06-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100123269-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR IMPRINTING PROCESS AND METHOD FOR FORMING ORGANIC LAYER OVER SUBSTRATE EBPL, PRDM9, LCP1 ALDH1A1 2730/4885ATM 4640/4885TSHR 4852/4885
US-20110250531-A1 Photosensitive Resin Composition for Color Filter, and Color Filter Using the Same PRMT1, PRMT5, MEP1A ALDH1A1 294/4885ATM 2494/4885TSHR 3135/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.