SCHEMBL80527

SCHEMBL80527

ClC(Cl)(Cl)c1nc(-c2ccccc2)nc(C(Cl)(Cl)Cl)n1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.47
KMT2A Q03164 4/20 0.47
HTT P42858 2/20 0.47
ADORA2A P29274 2/20 0.46
ADORA1 P30542 2/20 0.46
POLB P06746 1/20 0.46
ADORA3 P0DMS8 1/20 0.46
ADORA2B P29275 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
NPC1 O15118 4/20 0.44
RAB9A P51151 4/20 0.44
MAPK1 P28482 1/20 0.44
LMNA P02545 2/20 0.42
CCNB2 O95067 1/20 0.40
CCNE2 O96020 1/20 0.40
CDK1 P06493 1/20 0.40
CDK4 P11802 1/20 0.40
CCNB1 P14635 1/20 0.40
CCNA2 P20248 1/20 0.40
CCND1 P24385 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4900598 1.00 MEN1 (0.47) MEN1KMT2AHTTADORA2AADORA1
SCHEMBL125466 0.96 MEN1 (0.44) MEN1KMT2AHTTADORA2AADORA1
SCHEMBL7518324 0.92 MEN1 (0.41) MEN1KMT2AHTTADORA2AADORA1
SCHEMBL18344448 0.90 LMNA (0.41) MEN1KMT2AHTTADORA2AADORA1
Diphenylamine SCHEMBL391850 0.89 IDH2 (0.47) MEN1KMT2AHTTPOLBL3MBTL1
SCHEMBL8412982 0.88 NPC1 (0.38) MEN1KMT2AHTTADORA2AADORA1
SCHEMBL5676700 0.87 MEN1 (0.38) MEN1KMT2AHTTADORA2AADORA1
SCHEMBL3218601 0.87 MEN1 (0.38) MEN1KMT2AHTTADORA2AADORA1
SCHEMBL9079576 0.86 L3MBTL1 (0.64) MEN1KMT2AHTTADORA2AADORA1
SCHEMBL8956397 0.86 NPC1 (0.41) MEN1KMT2AHTTADORA2AADORA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 4720 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121873631-B Spin-on carbon composition, semiconductor preparation method and semiconductor device Jiageng Innovation Laboratory (CN) 2026-05-26 CN claimed
CN-122011922-A Bottom anti-reflection coating composition and preparation and application thereof 嘉庚创新实验室 2026-05-12 CN claimed
US-20240294771-A1 ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER Tan Kah Kee Innovation Laboratory (CN) 2024-09-05 US claimed
CN-115368494-B Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof 瑞红(苏州)电子化学品股份有限公司 2024-03-29 CN claimed
CN-110832397-B Composition for forming resist underlayer film, and method for forming resist pattern 日产化学株式会社 2023-12-15 CN claimed
WO-2023070957-A1 ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER 嘉庚创新实验室 2023-05-04 WO claimed
US-11491711-B2 Method of making 3D printed objects using two distinct light sources PHOTOCENTRIC LIMITED (GB) 2022-11-08 US claimed
CN-113913075-B Anti-reflective coating composition and crosslinkable polymer 嘉庚创新实验室 2022-09-20 CN claimed
CN-114690559-A Photosensitive resin composition, cured film and display device 株式会社东进世美肯 2022-07-01 CN claimed
CN-114432160-A Dental composite material, multilayer dental composite material, and preparation method and application thereof 香港城市大学深圳研究院 2022-05-06 CN claimed
EP-0592790-A1 Negative photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1994-04-20 EP claimed
EP-0563925-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1993-10-06 EP claimed
EP-0557555-A1 Photopolymerizable composition Mitsubishi Chemical Corporation (JP) 1993-09-01 EP claimed
US-5219709-A Addition polymerizable unsaturated compound, photoinitiator system of squarylium dye and halomethyl-s-triazine compound MITSUBISHI KASEI CORPORATION (JP) 1993-06-15 US claimed
US-5049481-A Merocyanine compound FUJI PHOTO FILM CO., LTD. (JP) 1991-09-17 US claimed
EP-0379200-A2 Photopolymerizable composition MITSUBISHI KASEI CORPORATION (JP) 1990-07-25 EP claimed
EP-0137228-B1 PHOTOPOLYMERIZABLE COMPOSITION FUJI PHOTO FILM CO., LTD. (JP) 1988-10-05 EP claimed
EP-0137228-A2 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1985-04-17 EP claimed
US-4359524-A ANTIHALATION LAYER OF HALOGEN COMPOUND AND MEROCYANIN DYE FUJI PHOTO FILM CO., LTD. (JP) 1982-11-16 US claimed
US-4239850-A PHOTOINITIATOR OF AN UNSATURATED KETONE AND A TRIHALOMETHYL TRIAZINE FUJI PHOTO FILM CO., LTD. (JP) 1980-12-16 US claimed