SCHEMBL8649732

SCHEMBL8649732

O=C(c1cc(O)nc(O)c1)c1cc(O)c(O)cc1O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HPGD P15428 5/20 0.39
▸ LMNA P02545 3/20 0.39
▸ MAPT P10636 3/20 0.39
▸ RECQL P46063 2/20 0.39
▸ HSD17B10 Q99714 2/20 0.39
▸ KDM4E B2RXH2 1/20 0.39
▸ CYP3A4 P08684 1/20 0.39
▸ ALDH1A1 P00352 5/20 0.38
▸ ALOX15 P16050 3/20 0.38
▸ TSHR P16473 2/20 0.38
▸ TDP1 Q9NUW8 1/20 0.38
▸ HDAC1 Q13547 1/20 0.37
▸ KMT2A Q03164 3/20 0.36
▸ MEN1 O00255 2/20 0.36
▸ USP2 O75604 1/20 0.36
▸ GAA P10253 1/20 0.36
▸ KEAP1 Q14145 1/20 0.36
▸ NFE2L2 Q16236 1/20 0.36
▸ FASN P49327 1/20 0.34
▸ HTT P42858 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8650586 0.79 MEN1 (0.62) HPGDLMNAMAPTKDM4EALDH1A1
SCHEMBL11757510 0.78 HDAC1 (0.59) HPGDLMNAMAPTRECQLHSD17B10
SCHEMBL29375554 0.78 FASN (0.58) HPGDLMNAMAPTRECQLHSD17B10
SCHEMBL759680 0.78 FASN (0.58) HPGDLMNAMAPTRECQLHSD17B10
SCHEMBL8650745 0.77 IGFBP3 (0.40) HPGDLMNAMAPTRECQLHSD17B10
SCHEMBL7897387 0.77 HPGD (0.50) HPGDLMNAMAPTRECQLHSD17B10
SCHEMBL8655190 0.75 HDAC1 (0.70) HPGDLMNAMAPTRECQLHSD17B10
SCHEMBL8649376 0.73 MAPT (0.38) HPGDLMNAMAPTRECQLHSD17B10
SCHEMBL8651998 0.72 FASN (0.68) HPGDLMNAMAPTRECQLHSD17B10
SCHEMBL19003399 0.72 CA12 (0.56) HPGDLMNAMAPTRECQLHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0443533-B1 Positive photoresist composition FUJI PHOTO FILM CO LTD (JP) 1998-09-30 — — EP disclosed
EP-0443533-A2 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1991-08-28 — — EP disclosed
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