SCHEMBL8649376

SCHEMBL8649376

O=C(c1ccc(O)nc1)c1cc(O)c(O)cc1O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 5/20 0.38
▸ HPGD P15428 5/20 0.38
▸ KDM4E B2RXH2 2/20 0.38
▸ RECQL P46063 2/20 0.38
▸ HSD17B10 Q99714 2/20 0.38
▸ LMNA P02545 1/20 0.38
▸ CYP3A4 P08684 1/20 0.38
▸ PTGS2 P35354 2/20 0.36
▸ MEN1 O00255 3/20 0.36
▸ KMT2A Q03164 3/20 0.36
▸ GAA P10253 2/20 0.36
▸ USP2 O75604 1/20 0.36
▸ KEAP1 Q14145 1/20 0.36
▸ NFE2L2 Q16236 1/20 0.36
▸ ALDH1A1 P00352 4/20 0.36
▸ HTT P42858 2/20 0.36
▸ RXRA P19793 1/20 0.36
▸ SPR P35270 4/20 0.35
▸ TP53 P04637 2/20 0.35
▸ NPC1 O15118 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8652198 0.77 HDAC1 (0.56) MAPTHPGDKDM4ERECQLHSD17B10
SCHEMBL8651481 0.76 FASN (0.53) MAPTHPGDKDM4ERECQLHSD17B10
SCHEMBL8650745 0.75 IGFBP3 (0.40) MAPTHPGDKDM4ERECQLHSD17B10
SCHEMBL19003399 0.75 CA12 (0.56) MAPTHPGDKDM4ERECQLHSD17B10
SCHEMBL22156268 0.75 LIG1 (0.59) MAPTHPGDKDM4ERECQLHSD17B10
SCHEMBL8649732 0.73 HPGD (0.39) MAPTHPGDKDM4ERECQLHSD17B10
SCHEMBL170272 0.71 LMNA (0.66) MAPTHPGDKDM4ERECQLHSD17B10
SCHEMBL30063117 0.71 LMNA (0.66) MAPTHPGDKDM4ERECQLHSD17B10
SCHEMBL7897387 0.71 HPGD (0.50) MAPTHPGDKDM4ERECQLHSD17B10
SCHEMBL14547211 0.70 MEN1 (0.58) MAPTHPGDRECQLHSD17B10LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0443533-B1 Positive photoresist composition FUJI PHOTO FILM CO LTD (JP) 1998-09-30 — — EP disclosed
EP-0443533-A2 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1991-08-28 — — EP disclosed
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