SCHEMBL8651998

SCHEMBL8651998

O=C(c1cc(O)nc(O)c1)c1c(O)cc(O)cc1O

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FASN P49327 1/20 0.68
CYP3A4 P08684 7/20 0.46
MEN1 O00255 5/20 0.46
KMT2A Q03164 5/20 0.46
HPGD P15428 2/20 0.46
PTGS1 P23219 1/20 0.42
DRD3 P35462 1/20 0.42
ACHE P22303 2/20 0.41
SYNJ2 O15056 1/20 0.39
NR1H2 P55055 1/20 0.38
NR1H3 Q13133 1/20 0.38
LMNA P02545 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
NPSR1 Q6W5P4 1/20 0.38
POLB P06746 2/20 0.35
MAPT P10636 2/20 0.35
TDP1 Q9NUW8 2/20 0.35
KDM4E B2RXH2 1/20 0.35
SLC16A3 O15427 1/20 0.35
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8648142 0.82 FASN (0.54) FASNMEN1KMT2AHPGDLMNA
SCHEMBL9639010 0.81 FASN (1.00) FASNCYP3A4MEN1KMT2AHPGD
SCHEMBL6272879 0.78 FASN (0.75) FASNCYP3A4MEN1KMT2AHPGD
SCHEMBL352504 0.77 FASN (0.74) FASNCYP3A4MEN1KMT2AHPGD
SCHEMBL3656921 0.77 FASN (0.73) FASNCYP3A4MEN1KMT2AHPGD
SCHEMBL8650586 0.76 MEN1 (0.62) MEN1KMT2AHPGDLMNASMN1; SMN2
SCHEMBL8654204 0.76 FASN (0.53) FASNCYP3A4MEN1KMT2AHPGD
Iriflophenone SCHEMBL9148205 0.73 FASN (0.67) FASNCYP3A4MEN1KMT2AHPGD
SCHEMBL8649732 0.72 HPGD (0.39) FASNCYP3A4MEN1KMT2AHPGD
SCHEMBL8651481 0.72 FASN (0.53) FASNCYP3A4MEN1KMT2AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0443533-B1 Positive photoresist composition FUJI PHOTO FILM CO LTD (JP) 1998-09-30 EP disclosed
EP-0443533-A2 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1991-08-28 EP disclosed