Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.50 |
| ▸ | THRB | P10828 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | APEX1 | P27695 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2421204 | 0.86 | TSHR (0.50) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL12213191 | 0.81 | TSHR (0.35) | TSHRTHRBALDH1A1TDP1 | |
| SCHEMBL27713534 | 0.80 | TSHR (0.45) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL587102 | 0.80 | TSHR (0.54) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL21313125 | 0.80 | TSHR (0.54) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL9704499 | 0.80 | TSHR (0.54) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL12687399 | 0.80 | — | — | |
| SCHEMBL5098395 | 0.80 | TSHR (0.54) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL1389549 | 0.80 | TSHR (0.54) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL29032038 | 0.79 | TSHR (0.32) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 164 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11281102-B2 | Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2022-03-22 | — | — | US | disclosed |
| US-11111320-B2 | Addition-fragmentation oligomers | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2021-09-07 | — | — | US | disclosed |
| EP-3685199-B1 | METHODS OF MANUFACTURING COATED CONTACT LENSES | COOPERVISION INT LTD (GB) | 2021-08-04 | — | — | EP | disclosed |
| US-11067831-B2 | Methods of manufacturing coated contact lenses | COOPERVISION INTERNATIONAL LIMITED (GB) | 2021-07-20 | — | — | US | disclosed |
| EP-3326711-B1 | GRAFT COPOLYMER FUNCTIONALIZED ARTICLE | 3M INNOVATIVE PROPERTIES CO (US) | 2021-07-07 | — | — | EP | disclosed |
| CN-110730790-B | Fluorine-containing monomer, fluorine-containing polymer, composition for forming pattern using same, and method for forming pattern using same | 中央硝子株式会社 | 2021-06-15 | — | — | CN | disclosed |
| CN-105717744-B | Monomer, polymer, resist composition and patterning method | 信越化学工业株式会社 | 2020-10-23 | — | — | CN | disclosed |
| EP-3685199-A1 | METHODS OF MANUFACTURING COATED CONTACT LENSES | CooperVision International Holding Company, LP (BB) | 2020-07-29 | — | — | EP | disclosed |
| EP-2675783-B1 | ADDITION-FRAGMENTATION AGENTS | 3M INNOVATIVE PROPERTIES CO (US) | 2020-04-22 | — | — | EP | disclosed |
| US-20200089116-A1 | Fluorine-Containing Monomer, Fluorine-Containing Polymer, Pattern Forming Composition Using Same, and Pattern Forming Method of Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2020-03-19 | — | — | US | disclosed |
| US-20110177453-A1 | Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-07-21 | — | — | US | disclosed |
| US-20110177453-A1 | Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-07-21 | — | — | US | disclosed |
| US-20110151381-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-06-23 | — | — | US | disclosed |
| US-20110151381-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-06-23 | — | — | US | disclosed |
| US-20110151381-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-06-23 | — | — | US | disclosed |
| CN-101809064-A | Polyamide resin, photosensitive resin composition, method for forming cured relief pattern, and semiconductor device | ASAHI KASEI E MATERIALS CORP | 2010-08-18 | — | — | CN | disclosed |
| WO-2010044372-A1 | FLUORINE-CONTAINING SULFONATES HAVING POLYMERIZABLE ANIONS AND MANUFACTURING METHOD THEREFOR, FLUORINE-CONTAINING RESINS, RESIST COMPOSITIONS, AND PATTERN-FORMING METHOD USING SAME | セントラル硝子株式会社 (JP) | 2010-04-22 | — | — | WO | disclosed |
| US-4855282-A | Recording material and method for producing the same | FUJI PHOTO FILM CO., LTD. (JP) | 1989-08-08 | — | — | US | disclosed |
| US-4378411-A | HAVING ETHLENICALLY UNSATURATED PEPTIDE GROUPS; FOR GRAPHIC ARTS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1983-03-29 | — | — | US | disclosed |
| US-4304705-A | Radiation-curable polymers containing pendant unsaturated peptide groups derived from azlactone polymers | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1981-12-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110151381-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | AFF1, H1-0, FRG1 | TSHR 2728/4885THRB 2552/4885ALDH1A1 629/4885 |
| US-20110177453-A1 | Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same | WASF2, EEF2, IKZF2 | TSHR 2715/4885THRB 3531/4885ALDH1A1 2304/4885 |
| US-11111320-B2 | Addition-fragmentation oligomers | ECPAS, ITGA8, NBAS | TSHR 4794/4885THRB 4239/4885ALDH1A1 2212/4885 |
| US-11281102-B2 | Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same | AFF4, AFF1, AFF2 | TSHR 1939/4885THRB 4083/4885ALDH1A1 1410/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.