SCHEMBL8660756

SCHEMBL8660756

CCCC[B-](c1ccccc1)(c1ccccc1)c1ccccc1.CCCC[B-](c1ccccc1)(c1ccccc1)c1ccccc1.C[N+](C)(C)C[S+](=O)(c1ccccc1)c1ccccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5925671 0.82 HPGD (0.33)
SCHEMBL8757351 0.80 CES2 (0.34)
Tetramethylammonium Ion SCHEMBL1276928 0.79 DNM1 (0.39)
SCHEMBL225939 0.78 TSHR (0.38)
Lithium Ion SCHEMBL503758 0.76 TSHR (0.37)
SCHEMBL7092511 0.76 TSHR (0.37)
Ammonia Solution, Strong SCHEMBL9771941 0.76 TSHR (0.37)
SCHEMBL5078343 0.76 TSHR (0.37)
SCHEMBL8772308 0.76 TSHR (0.37)
Cetrimonium SCHEMBL9771951 0.74 DNM1 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0690074-B1 Photopolymerization initiator composition and photopolymerizable composition TOYO INK MFG CO (JP) 1998-09-02 EP disclosed
US-5654319-A ANTIPSYCHOTIC AND ANALGESIC AGENTS HOECHST MARION ROUSSEL, INC. (US) 1997-08-05 US disclosed
US-5500453-A INITIATOR FOR PHOTOSENSITIVE FREE RADICAL CURING/ POLYMERIZATION OF UNSATURATED COMPOUNDS TOYO INK MANUFACTURING CO., LTD. (JP) 1996-03-19 US disclosed