Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | TAAR1 | Q96RJ0 | 3/20 | 0.38 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.37 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | NOS2 | P35228 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.35 |
| ▸ | DPP4 | P27487 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL892810 | 0.80 | THRB (0.44) | TSHRTHRBCYP3A4TAAR1ADRA2A | |
| SCHEMBL18980935 | 0.76 | LMNA (0.46) | TSHRTHRBCYP3A4ADRA2AADRA2C | |
| SCHEMBL7553120 | 0.76 | THRB (0.41) | TSHRTHRBCYP3A4TAAR1ADRA2A | |
| SCHEMBL11835643 | 0.73 | TSHR (0.48) | TSHRTAAR1ADRA2AADRA2CCYP2D6 | |
| SCHEMBL498588 | 0.72 | TSHR (0.52) | TSHRTAAR1ADRA2AADRA2CCYP2D6 | |
| SCHEMBL2240790 | 0.72 | TSHR (0.52) | TSHRTAAR1ADRA2AADRA2CCYP2D6 | |
| SCHEMBL304645 | 0.72 | TSHR (0.52) | TSHRTAAR1ADRA2AADRA2CCYP2D6 | |
| SCHEMBL306112 | 0.72 | TSHR (0.52) | TSHRTAAR1ADRA2AADRA2CCYP2D6 | |
| SCHEMBL7929659 | 0.71 | THRB (0.41) | TSHRTHRBCYP3A4TAAR1ADRA2A | |
| SCHEMBL13641888 | 0.71 | THRB (0.41) | THRBCYP3A4TAAR1ADRA2AADRA2C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0465064-B1 | Process for forming patterns | FUJITSU LTD (JP) | 1998-12-09 | — | — | EP | disclosed |
| EP-0465064-A2 | Resist and process for forming patterns using the same | FUJITSU LIMITED (JP) | 1992-01-08 | — | — | EP | disclosed |