SCHEMBL8667263

SCHEMBL8667263

CC1(C)CC(C)(c2ccc(C(=O)O)c(C(=O)O)c2)c2c1ccc(C(=O)O)c2C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
RXRA P19793 11/20 0.35
CYP26A1 O43174 3/20 0.33
CYP26B1 Q9NR63 3/20 0.33
CDC25A P30304 1/20 0.33
CDC25B P30305 1/20 0.33
HSD17B10 Q99714 1/20 0.33
RXRB P28702 4/20 0.32
RXRG P48443 3/20 0.32
ALDH1A1 P00352 1/20 0.32
RARG P13631 7/20 0.32
RARB P10826 5/20 0.32
RARA P10276 4/20 0.32
CCR2 P41597 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1674793 0.86 MEN1 (0.38) ALDH1A1RARGRARBRARACCR2
SCHEMBL10439478 0.84 CCR2 (0.37) RXRACYP26A1CYP26B1RXRBRXRG
SCHEMBL434124 0.81 RXRA (0.39) RXRACYP26A1CYP26B1RXRBRXRG
SCHEMBL9326434 0.80 MAPK1 (0.32) RXRAALDH1A1
SCHEMBL31343374 0.79 NPSR1 (0.42) RXRACYP26A1CYP26B1CDC25ACDC25B
SCHEMBL1927049 0.79 NPSR1 (0.42) RXRACYP26A1CYP26B1CDC25ACDC25B
SCHEMBL9453693 0.78 RARB (0.46) RXRACYP26A1CYP26B1RXRBRXRG
SCHEMBL10439562 0.78 RXRA (0.43) RXRACYP26A1CYP26B1RXRBRXRG
SCHEMBL9248378 0.78 SLC6A4 (0.34) RXRARXRBRXRGCCR2
SCHEMBL9327609 0.74 RXRA (0.39) RXRACYP26A1CYP26B1RXRBRXRG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0362649-B1 Radiation-sensitive compositions and their use BASF AG (DE) 1994-03-02 EP claimed
US-5284734-A Insulating layers and printed circuits; precursors for polyimides and polyquinazolines BASF AKTIENGESELLSCHAFT (DE) 1994-02-08 US claimed
WO-2024147917-A1 DIELECTRIC FILM FORMING COMPOSITION CONTAINING ACYL GERMANIUM COMPOUND FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2024-07-11 WO disclosed
US-11899364-B2 Photosensitive polyimide compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2024-02-13 US disclosed
US-11782344-B2 Photosensitive polyimide compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2023-10-10 US disclosed
US-11721543-B2 Planarizing process and composition FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2023-08-08 US disclosed
EP-3286605-B1 PHOTOSENSITIVE POLYIMIDE COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2023-06-28 EP disclosed
EP-4182379-A1 DIELECTRIC FILM FORMING COMPOSITIONS FUJIFILM Electronic Materials U.S.A, Inc. (US) 2023-05-24 EP disclosed
EP-3286606-B1 PHOTOSENSITIVE POLYIMIDE COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2022-12-28 EP disclosed
WO-2022015695-A1 DIELECTRIC FILM FORMING COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2022-01-20 WO disclosed
US-20220017673-A1 Dielectric Film Forming Compositions FUJIFILM ELECTRONIC MAT USA INC (US) 2022-01-20 US disclosed
US-4914182-A AUTOPHOTOCROSSLINKABLE; PROTECTIVE FILMS, PHOTOGRAPHIC RELIEF IMAGES CIBA-GEIGY CORPORATION (US) 1990-04-03 US disclosed
US-4914181-A AUTOPHOTOCROSSLINKABLE; BASED ON CARBONYL-CONTAINING TETRACARBOXYLIC ACIDS AND ACYCLIC OR CARBO DIAMINES; PROTECTIVE COATINGS; PHOTORESISTS; VARNISHES; LACQUERS SEMICONDUCTORS CIBA-GEIGY CORPORATION (US) 1990-04-03 US disclosed
US-4808732-A CHEMICAL INTERMEDIATES FOR HOMO AND COPOLYIMIDES CIBA-GEIGY CORPORATION (US) 1989-02-28 US disclosed
US-4698295-A AUTOMATIC PHOTOCROSSLINKING CIBA-GEIGY CORPORATION (US) 1987-10-06 US disclosed
US-4677186-A AMINO DICARBOXYLIC ACID MONOMERS, PROTECITVE COATINGS CIBA-GEIGY CORPORATION (US) 1987-06-30 US disclosed
US-4657832-A HOMO-AND COPOLYMERS, OF POLYIMIDES, POLYAMIDES, POLYESTERS AND OTHERS CIBA-GEIGY CORPORATION (US) 1987-04-14 US disclosed
US-4656116-A CROSSLINKABLE SOLUTIONS OF SOLVENT, POLYIMIDE AND POLYAZIDE CHROMOGEN; PHOTORESISTS; PHOTOLITHOGRAPHY CIBA-GEIGY CORPORATION (US) 1987-04-07 US disclosed
US-4629777-A RADIATION-SENSITIVE, AUTOPHOTOCROSSLINKABLE; FILMS, COATINGS CIBA-GEIGY CORPORATION (US) 1986-12-16 US disclosed
US-4629685-A PROTECTIVE FILMS OR PHOTOGRAPHIC RELIEF IMAGES CIBA-GEIGY CORPORATION (US) 1986-12-16 US disclosed