SCHEMBL9327609

SCHEMBL9327609

CC1(C)CC(C)(c2ccc(C(=O)O)c(C(=O)O)c2)c2cc(OC(=O)O)c(OC(=O)O)cc21

nearest known ligand 0.39

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
RXRA P19793 17/20 0.39
HNF4A P41235 3/20 0.38
ALDH1A1 P00352 1/20 0.36
KDM4E B2RXH2 1/20 0.35
CYP26A1 O43174 2/20 0.32
CYP26B1 Q9NR63 2/20 0.32
RXRB P28702 4/20 0.32
RXRG P48443 3/20 0.32
RARA P10276 1/20 0.32
RARB P10826 1/20 0.32
RARG P13631 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL434124 0.88 RXRA (0.39) RXRAHNF4AALDH1A1CYP26A1CYP26B1
SCHEMBL10439562 0.84 RXRA (0.43) RXRACYP26A1CYP26B1RXRBRXRG
SCHEMBL9326434 0.83 MAPK1 (0.32) RXRAHNF4AALDH1A1
SCHEMBL31343374 0.80 NPSR1 (0.42) RXRAALDH1A1CYP26A1CYP26B1RARB
SCHEMBL1927049 0.80 NPSR1 (0.42) RXRAALDH1A1CYP26A1CYP26B1RARB
SCHEMBL9453693 0.79 RARB (0.46) RXRAALDH1A1CYP26A1CYP26B1RXRB
SCHEMBL10455187 0.75 RXRA (0.48) RXRAHNF4ACYP26A1CYP26B1RXRB
SCHEMBL8667263 0.74 RXRA (0.35) RXRAALDH1A1CYP26A1CYP26B1RXRB
SCHEMBL9149973 0.73 RXRA (0.43) RXRACYP26A1CYP26B1RXRBRXRG
SCHEMBL10439478 0.72 CCR2 (0.37) RXRAALDH1A1CYP26A1CYP26B1RXRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0362649-B1 Radiation-sensitive compositions and their use BASF AG (DE) 1994-03-02 EP claimed
EP-0362649-B1 Radiation-sensitive compositions and their use BASF AG (DE) 1994-03-02 EP disclosed
EP-0437732-B1 Method for preparing polyamic acids and polyimides BASF LACKE & FARBEN (DE) 1993-11-03 EP disclosed
EP-0362644-B1 RADIATION-SENSITIVE COMPOSITIONS AND THEIR USE BASF Aktiengesellschaft (DE) 1993-05-26 EP disclosed
EP-0437732-A1 Method for preparing polyamic acids and polyimides BASF Lacke + Farben AG (DE) 1991-07-24 EP disclosed
EP-0362649-A2 Radiation-sensitive compositions and their use BASF Aktiengesellschaft (DE) 1990-04-11 EP disclosed
EP-0362644-A1 Radiation-sensitive compositions and their use BASF Aktiengesellschaft (DE) 1990-04-11 EP disclosed
EP-0315216-A2 Polyimides, process for their preparation and their use CIBA-GEIGY AG (CH) 1989-05-10 EP disclosed
EP-0182745-A2 Polyimides, process for their fabrication, and their use CIBA-GEIGY AG (CH) 1986-05-28 EP disclosed
EP-0181837-A2 Process for the manufacture of films and relief pictures from polyimides CIBA-GEIGY AG (CH) 1986-05-21 EP disclosed
EP-0162017-A2 Homo and copolymer, process of their crosslinking and their use CIBA-GEIGY AG (CH) 1985-11-21 EP disclosed
EP-0141781-A2 Light-sensitive coating composition and use thereof CIBA-GEIGY AG (CH) 1985-05-15 EP disclosed
EP-0134752-A1 Layered material and its use CIBA-GEIGY AG (CH) 1985-03-20 EP disclosed
EP-0132221-A1 Polyimide, process for its preparation and its use CIBA-GEIGY AG (CH) 1985-01-23 EP disclosed
EP-0099338-A1 Epoxy resin systems modified with thermoplastic resins CIBA-GEIGY AG (CH) 1984-01-25 EP disclosed
EP-0092524-A2 Radiation-sensible coating composition and its use CIBA-GEIGY AG (CH) 1983-10-26 EP disclosed