SCHEMBL9326434

SCHEMBL9326434

CC1(C)CC(C)(c2ccc(C(=O)O)c(C(=O)O)c2)c2c1ccc(OC(=O)O)c2OC(=O)O

nearest known ligand 0.32

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.32
RXRA P19793 3/20 0.32
ALDH1A1 P00352 1/20 0.31
HNF4A P41235 1/20 0.31
CFD P00746 1/20 0.30
MAPT P10636 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9327609 0.83 RXRA (0.39) RXRAALDH1A1HNF4A
SCHEMBL3925204 0.83 MEN1 (0.39) MAPT
SCHEMBL8667263 0.80 RXRA (0.35) RXRAALDH1A1
SCHEMBL10439478 0.78 CCR2 (0.37) RXRAALDH1A1
SCHEMBL434124 0.76 RXRA (0.39) RXRAALDH1A1HNF4A
SCHEMBL1927049 0.73 NPSR1 (0.42) MAPK1RXRAALDH1A1MAPTTDP1
SCHEMBL31343374 0.73 NPSR1 (0.42) MAPK1RXRAALDH1A1MAPTTDP1
SCHEMBL9453693 0.73 RARB (0.46) MAPK1RXRAALDH1A1
SCHEMBL10439562 0.72 RXRA (0.43) RXRA
SCHEMBL1674793 0.67 MEN1 (0.38) ALDH1A1MAPTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0362649-B1 Radiation-sensitive compositions and their use BASF AG (DE) 1994-03-02 EP claimed
EP-0362649-B1 Radiation-sensitive compositions and their use BASF AG (DE) 1994-03-02 EP disclosed
EP-0437732-B1 Method for preparing polyamic acids and polyimides BASF LACKE & FARBEN (DE) 1993-11-03 EP disclosed
EP-0362644-B1 RADIATION-SENSITIVE COMPOSITIONS AND THEIR USE BASF Aktiengesellschaft (DE) 1993-05-26 EP disclosed
EP-0437732-A1 Method for preparing polyamic acids and polyimides BASF Lacke + Farben AG (DE) 1991-07-24 EP disclosed
EP-0362649-A2 Radiation-sensitive compositions and their use BASF Aktiengesellschaft (DE) 1990-04-11 EP disclosed
EP-0362644-A1 Radiation-sensitive compositions and their use BASF Aktiengesellschaft (DE) 1990-04-11 EP disclosed
EP-0315216-A2 Polyimides, process for their preparation and their use CIBA-GEIGY AG (CH) 1989-05-10 EP disclosed
EP-0182745-A2 Polyimides, process for their fabrication, and their use CIBA-GEIGY AG (CH) 1986-05-28 EP disclosed
EP-0181837-A2 Process for the manufacture of films and relief pictures from polyimides CIBA-GEIGY AG (CH) 1986-05-21 EP disclosed
EP-0162017-A2 Homo and copolymer, process of their crosslinking and their use CIBA-GEIGY AG (CH) 1985-11-21 EP disclosed
EP-0141781-A2 Light-sensitive coating composition and use thereof CIBA-GEIGY AG (CH) 1985-05-15 EP disclosed
EP-0134752-A1 Layered material and its use CIBA-GEIGY AG (CH) 1985-03-20 EP disclosed
EP-0132221-A1 Polyimide, process for its preparation and its use CIBA-GEIGY AG (CH) 1985-01-23 EP disclosed
EP-0099338-A1 Epoxy resin systems modified with thermoplastic resins CIBA-GEIGY AG (CH) 1984-01-25 EP disclosed
EP-0092524-A2 Radiation-sensible coating composition and its use CIBA-GEIGY AG (CH) 1983-10-26 EP disclosed