Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.34 |
| ▸ | MMP9 | P14780 | 1/20 | 0.34 |
| ▸ | MMP8 | P22894 | 1/20 | 0.34 |
| ▸ | MMP14 | P50281 | 1/20 | 0.34 |
| ▸ | ACACB | O00763 | 1/20 | 0.33 |
| ▸ | ANPEP | P15144 | 2/20 | 0.32 |
| ▸ | RNPEP | Q9H4A4 | 2/20 | 0.32 |
| ▸ | DNPEP | Q9ULA0 | 1/20 | 0.32 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.32 |
| ▸ | NAMPT | P43490 | 1/20 | 0.31 |
| ▸ | CTSK | P43235 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20752394 | 0.91 | MMP9 (0.43) | TSHRMEN1KMT2AALDH1A1MMP9 | |
| SCHEMBL12036308 | 0.84 | MEN1 (0.47) | TSHRMEN1KMT2AALDH1A1THRB | |
| SCHEMBL134916 | 0.83 | TSHR (0.47) | TSHRMEN1KMT2AALDH1A1THRB | |
| SCHEMBL22425799 | 0.82 | MEN1 (0.47) | TSHRMEN1KMT2AALDH1A1ACACB | |
| SCHEMBL13862904 | 0.82 | MEN1 (0.50) | TSHRMEN1KMT2AALDH1A1THRB | |
| SCHEMBL18016179 | 0.82 | MEN1 (0.50) | TSHRMEN1KMT2AALDH1A1THRB | |
| SCHEMBL10051130 | 0.81 | USP2 (0.42) | TSHRMEN1KMT2ATHRBTGFBR1 | |
| SCHEMBL553153 | 0.79 | ALDH1A1 (0.50) | TSHRMEN1KMT2AALDH1A1THRB | |
| SCHEMBL24664661 | 0.79 | MEN1 (0.53) | TSHRMEN1KMT2AALDH1A1ACACB | |
| SCHEMBL4849807 | 0.79 | KMT2A (0.49) | TSHRMEN1KMT2AALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0283990-B1 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO LTD (JP) | 1994-01-26 | — | — | EP | claimed |
| US-4996132-A | Heat-resistant photosensitive resin composition | TOYKO OHKA KOGYO CO. LTD. (JP) | 1991-02-26 | — | — | US | claimed |
| EP-0283990-A2 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1988-09-28 | — | — | EP | claimed |
| EP-0280295-A2 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1988-08-31 | — | — | EP | claimed |
| US-10513573-B2 | Process for producing silver nanowires and agent for controlling growth of silver nanowires | SEIKO PMC CORPORATION (JP) | 2019-12-24 | — | — | US | disclosed |
| US-20170174804-A1 | Process for Producing Silver Nanowires and Agent for Controlling Growth of Silver Nanowires | CHEMIPAZ CORPORATION (JP) | 2017-06-22 | — | — | US | disclosed |
| US-9630250-B2 | Process for producing silver nanowires and agent for controlling growth of silver nanowires | SEIKO PMC CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-20150062238-A1 | BLACK INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD | FUJIFILM CORPORATION (JP) | 2015-03-05 | — | — | US | disclosed |
| US-20130255444-A1 | Process for Producing Silver Nanowires and Agent for Controlling Growth of Silver Nanowires | SEIKO PMC CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| US-8222326-B2 | Water-based ink composition for inkjet recording | FUJIFILM CORPORATION (JP) | 2012-07-17 | — | — | US | disclosed |
| US-20120076951-A1 | BLACK INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20100160504-A1 | WATER-BASED INK COMPOSITION FOR INKJET RECORDING | FUJIFILM CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100029840-A1 | WATER BASED INKJET RECORDING INK | FUJIFILM CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| US-7202016-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-04-10 | — | — | US | disclosed |
| US-20050214680-A1 | Radiation-sensitive resin composition | MIYAJI MASAAKI | 2005-09-29 | — | — | US | disclosed |
| US-6933094-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-08-23 | — | — | US | disclosed |
| US-20020058201-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-05-16 | — | — | US | disclosed |
| EP-1193558-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| EP-0283990-B1 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO LTD (JP) | 1994-01-26 | — | — | EP | disclosed |
| EP-0283990-A2 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1988-09-28 | — | — | EP | disclosed |