Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 3/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.53 |
| ▸ | MAPT | P10636 | 3/20 | 0.53 |
| ▸ | LMNA | P02545 | 2/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.53 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.53 |
| ▸ | PDK2 | Q15119 | 6/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.48 |
| ▸ | ESR1 | P03372 | 1/20 | 0.45 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.45 |
| ▸ | CA2 | P00918 | 2/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29690347 | 1.00 | MEN1 (0.53) | MEN1KMT2AMAPTLMNAKDM4E | |
| SCHEMBL20253534 | 0.92 | PDK2 (0.47) | MEN1KMT2AMAPTLMNAKDM4E | |
| SCHEMBL31513318 | 0.90 | MEN1 (0.43) | MEN1KMT2AMAPTLMNAKDM4E | |
| SCHEMBL21858091 | 0.90 | MEN1 (0.43) | MEN1KMT2AMAPTLMNAKDM4E | |
| SCHEMBL14353392 | 0.85 | MEN1 (0.57) | MEN1KMT2AMAPTLMNAKDM4E | |
| SCHEMBL21858067 | 0.84 | PDK2 (0.50) | MEN1KMT2AMAPTLMNAKDM4E | |
| SCHEMBL30292768 | 0.84 | PDK2 (0.50) | MEN1KMT2AMAPTLMNAKDM4E | |
| SCHEMBL3022254 | 0.79 | PTGS2 (0.36) | MEN1KMT2AMAPTLMNAKDM4E | |
| SCHEMBL18184923 | 0.79 | MEN1 (0.50) | MEN1KMT2AMAPTLMNAKDM4E | |
| SCHEMBL973220 | 0.78 | MEN1 (0.46) | MEN1KMT2AMAPTLMNAKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250263363-A1 | OLIGOMERIC BINAPHTYL COMPOUNDS AND THERMOPLASTIC RESINS | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-08-21 | — | — | US | disclosed |
| EP-4594286-A1 | OLIGOMERIC BINAPHTYL COMPOUNDS AND THERMOPLASTIC RESINS | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-08-06 | — | — | EP | disclosed |
| WO-2025089429-A1 | OLIGOMERIC BINAPHTHYL COMPOUNDS AND THERMOPLASTIC RESINS | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-05-01 | — | — | WO | disclosed |
| WO-2025088066-A1 | OLIGOMERIC BINAPHTHYL COMPOUNDS AND THERMOPLASTIC RESINS | REUTER CHEMISCHE APPARATEBAU E.K. (DE) | 2025-05-01 | — | — | WO | disclosed |
| EP-4514880-A1 | OLIGOMERIC BINAPHTYL COMPOUNDS AND THERMOPLASTIC RESINS | Mitsubishi Gas Chemical Company, Inc. (JP) | 2025-03-05 | — | — | EP | disclosed |
| EP-4514787-A1 | OLIGOMERIC BINAPHTHYL COMPOUNDS AND THERMOPLASTIC RESINS | Reuter Chemische Apparatebau e.K. (DE) | 2025-03-05 | — | — | EP | disclosed |
| US-20250034071-A1 | (HET)ARYL SUBSTITUTED BISPHENOL COMPOUNDS AND THERMOPLASTIC RESINS | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-01-30 | — | — | US | disclosed |
| US-20250019332-A1 | (HET)ARYL SUBSTITUTED BISPHENOL COMPOUNDS AND THERMOPLASTIC RESINS | REUTER CHEMISCHE APPBAU E K (DE) | 2025-01-16 | — | — | US | disclosed |
| WO-2024184503-A1 | SULFUR-CONTAINING HETEROCYCLIC COMPOUNDS AND THERMOPLASTIC RESINS | REUTER CHEMISCHE APPARATEBAU E.K. (DE) | 2024-09-12 | — | — | WO | disclosed |
| EP-4399199-A1 | (HET)ARYL SUBSTITUTED BISPHENOL COMPOUNDS AND THERMOPLASTIC RESINS | Reuter Chemische Apparatebau e.K. (DE) | 2024-07-17 | — | — | EP | disclosed |
| US-20120077903-A1 | EPOXY RESIN-BASED COATING COMPOSITION | SHOWA DENKO K.K. (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20100273940-A1 | EPOXY RESIN CURING AGENT, PROCESS FOR PREPARING THE SAME, AND EPOXY RESIN COMPOSITION | SHOWA DENKO K.K. (JP) | 2010-10-28 | — | — | US | disclosed |
| EP-2226347-A1 | EPOXY RESIN CURING AGENT, METHOD FOR PRODUCING THE SAME, AND EPOXY RESIN COMPOSITION | Showa Denko K.K. (JP) | 2010-09-08 | — | — | EP | disclosed |
| US-7714032-B2 | Thiol compound and photosensitive composition using the same | SHOWA DENKO K.K. (JP) | 2010-05-11 | — | — | US | disclosed |
| US-7622613-B2 | Thiol compound and photosensitive composition using the same | SHOWA DENKO K.K. (JP) | 2009-11-24 | — | — | US | disclosed |
| US-20080286690-A1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO K.K. | 2008-11-20 | — | — | US | disclosed |
| US-20080139688-A1 | Thiol Compound And Photosensitive Composition Using The Same | SHOWA DENKO K.K. (JP) | 2008-06-12 | — | — | US | disclosed |
| EP-1805137-B1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO KK (JP) | 2008-03-26 | — | — | EP | disclosed |
| EP-1805137-A1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2007-07-11 | — | — | EP | disclosed |
| WO-2006046736-A1 | THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME | SHOWA DENKO K.K. (JP) | 2006-05-04 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080139688-A1 | Thiol Compound And Photosensitive Composition Using The Same | TST, TMT1A, CRY1 | MEN1 1565/4885KMT2A 270/4885MAPT 658/4885 |
| US-20250019332-A1 | (HET)ARYL SUBSTITUTED BISPHENOL COMPOUNDS AND THERMOPLASTIC RESINS | CBR1, CBR3, CBX2 | MEN1 4579/4885KMT2A 926/4885MAPT 4185/4885 |
| US-20250034071-A1 | (HET)ARYL SUBSTITUTED BISPHENOL COMPOUNDS AND THERMOPLASTIC RESINS | CBR1, CBR3, AHR | MEN1 4344/4885KMT2A 956/4885MAPT 4345/4885 |
| US-20250263363-A1 | OLIGOMERIC BINAPHTYL COMPOUNDS AND THERMOPLASTIC RESINS | CBX2, CNPY2, BRIX1 | MEN1 3457/4885KMT2A 470/4885MAPT 4111/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.