SCHEMBL8707807

SCHEMBL8707807

Cc1cc(C)c(N2[C]N(c3c(C)cc(C)cc3C)C(Cl)=C2Cl)c(C)c1

nearest known ligand 0.32

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
RAPGEF4 Q8WZA2 4/20 0.32
ALDH1A1 P00352 3/20 0.32
KDM4E B2RXH2 2/20 0.32
MAPT P10636 2/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
MEN1 O00255 1/20 0.31
MPI P34949 1/20 0.31
KMT2A Q03164 1/20 0.31
POLB P06746 1/20 0.30
HTT P42858 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1177020 0.81 RAPGEF4 (0.35) RAPGEF4ALDH1A1KDM4EMAPTSMN1; SMN2
SCHEMBL18730215 0.78 KMT2A (0.31) SMN1; SMN2KMT2A
SCHEMBL2126289 0.77 ALDH1A1 (0.36) RAPGEF4ALDH1A1KDM4EMAPTSMN1; SMN2
SCHEMBL919716 0.74 CYP1A2 (0.38) RAPGEF4ALDH1A1KDM4EMAPTSMN1; SMN2
SCHEMBL919718 0.74 CYP1A2 (0.38) RAPGEF4ALDH1A1KDM4EMAPTSMN1; SMN2
SCHEMBL18109194 0.71 ALDH1A1 (0.31) ALDH1A1KDM4EMAPTSMN1; SMN2POLB
SCHEMBL760838 0.68 ALDH1A1 (0.33) RAPGEF4ALDH1A1KDM4EMAPTSMN1; SMN2
SCHEMBL34511 0.67 SELL (0.36) RAPGEF4ALDH1A1KDM4EMAPTSMN1; SMN2
SCHEMBL3277998 0.67 KDM4E (0.32) RAPGEF4ALDH1A1KDM4E
SCHEMBL1314635 0.66 CYP3A4 (0.55) RAPGEF4ALDH1A1KDM4EMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024039530-A1 SELECTIVE SIGE ETCHING USING THERMAL F2 WITH ADDITIVE LAM RESEARCH CORPORATION (US) 2024-02-22 WO disclosed
WO-2023168170-A1 SELECTIVE PRECISION ETCHING OF SEMICONDUCTOR MATERIALS LAM RESEARCH CORPORATION (US) 2023-09-07 WO disclosed
WO-2023069120-A1 IN SITU DECLOGGING IN PLASMA ETCHING LAM RESEARCH CORPORATION (US) 2023-04-27 WO disclosed
WO-2021202411-A1 SELECTIVE PRECISION ETCHING OF SEMICONDUCTOR MATERIALS LAM RESEARCH CORPORATION (US) 2021-10-07 WO disclosed
WO-1998027064-A1 RELATIVELY STABLE (1,3-DISUBSTITUTEDIMIDAZOL-2-YLIDENE)-TYPE CARBENES E.I. DU PONT DE NEMOURS AND COMPANY (US) 1998-06-25 WO disclosed