Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.48 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.48 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.48 |
| ▸ | HMGCR | P04035 | 1/20 | 0.44 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.44 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.44 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | CPT2 | P23786 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | FDPS | P14324 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | BLM | P54132 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | ACLY | P53396 | 3/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11600783 | 0.98 | TSHR (0.46) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL11329681 | 0.83 | TDP1 (0.42) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL11689517 | 0.80 | HMGCR (0.39) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL11684532 | 0.79 | HMGCR (0.38) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL2640685 | 0.78 | LMNA (0.38) | TSHRCYP2C19HIF1ACYP2D6ALDH1A1 | |
| SCHEMBL7111437 | 0.77 | NAALAD2 (0.44) | TSHRCYP2C19HIF1ACYP2D6ALDH1A1 | |
| SCHEMBL10903812 | 0.75 | HMGCR (0.48) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL11316650 | 0.74 | LMNA (0.35) | TSHRCYP2C19HIF1ACYP2D6ALDH1A1 | |
| SCHEMBL12931443 | 0.74 | FDPS (0.48) | FDPS | |
| SCHEMBL8017479 | 0.74 | FOLH1 (0.39) | TSHRALDH1A1TDP1FFAR1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 375 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113710761-B | Surface coated abrasive particles for tungsten polishing applications | CMC材料有限责任公司 | 2024-04-09 | — | — | CN | claimed |
| CN-111183195-B | Surface treated abrasive particles for tungsten buffing applications | CMC材料股份有限公司 | 2022-05-10 | — | — | CN | claimed |
| EP-3956411-A1 | SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS | CMC Materials, Inc. (US) | 2022-02-23 | — | — | EP | claimed |
| CN-113710761-A | Surface-coated abrasive particles for tungsten buffing applications | CMC材料股份有限公司 | 2021-11-26 | — | — | CN | claimed |
| US-20210198524-A1 | POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE | YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) | 2021-07-01 | — | — | US | claimed |
| WO-2020214662-A1 | SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS | CABOT MICROELECTRONICS CORPORATION (US) | 2020-10-22 | — | — | WO | claimed |
| EP-3692107-A1 | SURFACE TREATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS | Cabot Microelectronics Corporation (US) | 2020-08-12 | — | — | EP | claimed |
| CN-111183195-A | Surface treated abrasive particles for tungsten buffing applications | 嘉柏微电子材料股份公司 | 2020-05-19 | — | — | CN | claimed |
| WO-2019070793-A1 | SURFACE TREATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS | CABOT MICROELECTRONICS CORPORATION (US) | 2019-04-11 | — | — | WO | claimed |
| US-20180371293-A1 | POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE | YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) | 2018-12-27 | — | — | US | claimed |
| EP-3263688-A1 | IMPROVED SHINE IN SOFT WATER | The Procter & Gamble Company (US) | 2018-01-03 | — | — | EP | claimed |
| EP-3263687-A1 | ANTIMICROBIAL HARD SURFACE CLEANING COMPOSITION | The Procter & Gamble Company (US) | 2018-01-03 | — | — | EP | claimed |
| US-9340707-B2 | Polishing composition to be used to polish semiconductor substrate having silicon through electrode structure, and polishing method using polishing composition | FUJIMI INCORPORATED (JP) | 2016-05-17 | — | — | US | claimed |
| US-6503420-B1 | Such as lithium chloride and 2-phosphono-1,2,4-butanetri-carboxylic acid; environmentally friendly; efficient; durability | FMC CORPORATION | 2003-01-07 | — | — | US | claimed |
| WO-1999002767-A1 | A METHOD FOR PRE-FIBRILLATION OF LYOCELL | NOVO NORDISK A/S (DK) | 1999-01-21 | — | — | WO | claimed |
| EP-0728180-B1 | ADDITIVE FOR USE IN GLASS-BOTTLE WASHING AND ITS USE IN DECREASING GLASS CORROSION | HENKEL ECOLAB GMBH & CO OHG (DE) | 1998-08-26 | — | — | EP | claimed |
| US-5562830-A | IN MIXTURE WITH POLYEPOXYSUCCINIC ACID AND A PHOSPHONOCARBOXYLIC ACID | BETZ LABORATORIES, INC. (US) | 1996-10-08 | — | — | US | claimed |
| US-4086334-A | A CALCITONIN AND AN ADJUVANT CONTAINING CARBOXY AND/OR PHOSPHONO GROUPS | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DT) | 1978-04-25 | — | — | US | claimed |
| US-12516276-B2 | Surface treatment composition | FUJIMI INCORPORATED (JP) | 2026-01-06 | — | — | US | disclosed |
| US-3933427-A | Process for preventing corrosion and the formation of scale in water circulating system | BAYER AKTIENGESELLSCHAFT (DT) | 1976-01-20 | — | — | US | disclosed |