Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | NPC1 | O15118 | 2/20 | 0.33 |
| ▸ | RAB9A | P51151 | 2/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | APP | P05067 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.31 |
| ▸ | HAVCR2 | Q8TDQ0 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | S100B | P04271 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8990190 | 0.75 | — | — | |
| SCHEMBL3662419 | 0.73 | CA12 (0.35) | ALDH1A1CYP3A4TDP1SMN1; SMN2APP | |
| Orthotolidine SCHEMBL29386552 | 0.69 | CYP3A4 (1.00) | ALDH1A1CYP3A4TDP1TSHRNPC1 | |
| Orthotolidine SCHEMBL29365329 | 0.69 | CYP3A4 (1.00) | ALDH1A1CYP3A4TDP1TSHRNPC1 | |
| Orthotolidine SCHEMBL49414 | 0.69 | CYP3A4 (1.00) | ALDH1A1CYP3A4TDP1TSHRNPC1 | |
| SCHEMBL8720897 | 0.67 | ALDH1A1 (0.50) | ALDH1A1CYP3A4TDP1TSHRKDM4E | |
| SCHEMBL18967510 | 0.67 | CYP3A4 (0.55) | ALDH1A1CYP3A4TDP1TSHRNPC1 | |
| SCHEMBL102613 | 0.67 | ALDH1A1 (0.50) | ALDH1A1CYP3A4TDP1TSHRNPC1 | |
| Orthotolidine SCHEMBL6009632 | 0.67 | CYP3A4 (0.94) | ALDH1A1CYP3A4TDP1TSHRNPC1 | |
| Orthotolidine SCHEMBL2812115 | 0.67 | CYP3A4 (0.94) | ALDH1A1CYP3A4TDP1TSHRNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210139390-A1 | PRODUCTION METHOD OF ORGANIC COMPOUND | UNITIKA LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| EP-3819283-A1 | METHOD FOR PRODUCING ORGANIC COMPOUND | Unitika Ltd. (JP) | 2021-05-12 | — | — | EP | disclosed |
| WO-2020009016-A1 | METHOD FOR PRODUCING ORGANIC COMPOUND | ユニチカ株式会社 | 2020-01-09 | — | — | WO | disclosed |
| EP-0648796-B1 | Solutions of polyimide-forming substances and their use | SCHENECTADY INT INC (US) | 1998-08-26 | — | — | EP | disclosed |
| EP-0543409-B1 | Insulated wire | SUMITOMO ELECTRIC INDUSTRIES (JP) | 1996-07-17 | — | — | EP | disclosed |
| US-5493003-A | MIXTURES OF AMINES, AMIDES AND/OR ESTERS OF TETRACARBOXYLIC ACIDS HAVING AMIDO OR ESTER GROUPS SUBSTITUTED WITH CARBOXYL, SULFO, SILYL OR SILOXY GROUPS, ELECTRONICS | BASF LACKE + FARBEN AKTIENGESELLSCHAFT (DE) | 1996-02-20 | — | — | US | disclosed |
| US-5478917-A | Aromatic polyamines, tetracarboxylic acid amides and esters; smoothness, flexibility | BASF LACKE + FARBEN AKTIENGESELLSCHAFT (DE) | 1995-12-26 | — | — | US | disclosed |
| US-5474876-A | Carboxyl-containing polymeric precursor of heterocyclic polymer which is stable at high temperatures and soluble in polar solvents, copolymerizable unsaturated tertiary sulfonium salt, photoinitiator, polar aprotic organic solvent | BASF LACKE + FARBEN AG (DE) | 1995-12-12 | — | — | US | disclosed |
| EP-0648796-A1 | Solutions of polyimide-forming substances and their use | BASF Lacke + Farben AG (DE) | 1995-04-19 | — | — | EP | disclosed |
| EP-0648795-A1 | Solutions of polyimide-forming substances and their use as coating material | BASF Lacke + Farben AG (DE) | 1995-04-19 | — | — | EP | disclosed |
| EP-0571899-B1 | Radiation-curable mixture and its' use for producing high temperature-resistant relief structures | BASF LACKE & FARBEN (DE) | 1994-11-02 | — | — | EP | disclosed |
| EP-0573866-B1 | Method for forming patterned layers of heat-resistant polycondensates | BASF LACKE & FARBEN (DE) | 1994-11-02 | — | — | EP | disclosed |
| US-5356708-A | Conductor and insulating coating made from polyamideimide base coating | SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) | 1994-10-18 | — | — | US | disclosed |
| US-5350663-A | Construction of electrical circuits and protective or insulating layers for electronic components | BASF LACKE+ FARBEN AKTIENGESELLSCHAFT (DE) | 1994-09-27 | — | — | US | disclosed |
| EP-0573866-A1 | Method for forming patterned layers of heat-resistant polycondensates | BASF Lacke + Farben Aktiengesellschaft (DE) | 1993-12-15 | — | — | EP | disclosed |
| EP-0571899-A1 | Radiation-curable mixture and its' use for producing high temperature-resistant relief structures | BASF Lacke + Farben Aktiengesellschaft (DE) | 1993-12-01 | — | — | EP | disclosed |