Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.43 |
| ▸ | RECQL | P46063 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 6/20 | 0.42 |
| ▸ | MAPT | P10636 | 4/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.42 |
| ▸ | NPC1 | O15118 | 3/20 | 0.41 |
| ▸ | RAB9A | P51151 | 3/20 | 0.41 |
| ▸ | HPGD | P15428 | 3/20 | 0.39 |
| ▸ | MMP3 | P08254 | 1/20 | 0.39 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.39 |
| ▸ | BACE1 | P56817 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | PDCD1 | Q15116 | 1/20 | 0.36 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Biphenyl SCHEMBL11060969 | 0.96 | ALDH1A1 (0.40) | ALDH1A1RECQLSMN1; SMN2MAPTL3MBTL1 | |
| Biphenyl SCHEMBL10601883 | 0.93 | ALDH1A1 (0.45) | ALDH1A1RECQLSMN1; SMN2MAPTL3MBTL1 | |
| Biphenyl SCHEMBL1147617 | 0.90 | ALDH1A1 (0.53) | ALDH1A1SMN1; SMN2MAPTL3MBTL1NPC1 | |
| Biphenyl SCHEMBL8192900 | 0.90 | ALDH1A1 (0.53) | ALDH1A1SMN1; SMN2MAPTL3MBTL1NPC1 | |
| Biphenyl SCHEMBL5898513 | 0.90 | ALDH1A1 (0.53) | ALDH1A1SMN1; SMN2MAPTL3MBTL1NPC1 | |
| Biphenyl SCHEMBL51202 | 0.90 | ALDH1A1 (0.53) | ALDH1A1SMN1; SMN2MAPTL3MBTL1NPC1 | |
| Biphenyl SCHEMBL5727622 | 0.90 | ALDH1A1 (0.36) | ALDH1A1RECQLSMN1; SMN2MAPTL3MBTL1 | |
| Ether SCHEMBL21774921 | 0.90 | MMP3 (0.58) | MAPTRAB9AMMP3BCL2L1LMNA | |
| Biphenyl SCHEMBL10621537 | 0.87 | ALDH1A1 (0.50) | ALDH1A1SMN1; SMN2MAPTL3MBTL1NPC1 | |
| Biphenyl SCHEMBL11626397 | 0.87 | ALDH1A1 (0.50) | ALDH1A1SMN1; SMN2MAPTL3MBTL1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 783 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024109853-A1 | LITHIUM-ION BATTERY BASED ON IN-SITU NEGATIVE-ELECTRODE LITHIUM SUPPLEMENTATION, AND PREPARATION METHOD THEREFOR | 中国科学院深圳先进技术研究院 | 2024-05-30 | — | — | WO | claimed |
| CN-118085134-A | External electron donor composition, catalyst composition for preparing CPP aluminized film core layer special material and application | 中国石油天然气股份有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-116548710-B | Thorn wool top containing modified nylon plastic fastener for automobile seat | 浙江裕德新材科技有限公司 | 2024-01-23 | — | — | CN | claimed |
| CN-115663310-A | Lithium ion battery based on negative electrode in-situ lithium supplement and preparation method thereof | 中国科学院深圳先进技术研究院 | 2023-01-31 | — | — | CN | claimed |
| EP-3417017-B1 | LOW-EMISSION LIQUID FILM FOR SEALING CONSTRUCTIONS | SIKA TECH AG (CH) | 2022-11-09 | — | — | EP | claimed |
| CN-114687244-A | Thermosensitive engineering drawing and preparation method thereof | 河南江河纸业股份有限公司 | 2022-07-01 | — | — | CN | claimed |
| CN-110041176-B | Preparation method of thermosensitive paper sensitizer ethylene glycol diphenyl ether | 衢州学院 | 2022-06-07 | — | — | CN | claimed |
| EP-2618801-B2 | COSMETIC COMPOSITION COMPRISING AT LEAST ONE HYGROSCOPIC SALT, AT LEAST ONE AROMATIC POLYOL ETHER AND AT LEAST ONE DIOL, AND COSMETIC TREATMENT PROCESS | OREAL (FR) | 2021-01-20 | — | — | EP | claimed |
| CN-111876116-A | Polyimide modified epoxy resin composite conductive adhesive and preparation method thereof | 南北兄弟药业投资有限公司 | 2020-11-03 | — | — | CN | claimed |
| US-10759946-B2 | Low-emission liquid film for sealing buildings | SIKA TECHNOLOGY AG (CH) | 2020-09-01 | — | — | US | claimed |
| CN-101529339-A | Low etching photoresist cleaning agent and cleaning method thereof | ANJI MICROELECTRONICS SHANGHAI (CN) | 2009-09-09 | — | — | CN | claimed |
| EP-1241209-B1 | Solvent swell composition containing heterocyclic nitrogen compounds and glycols for texturing resinous material and desmearing and removing resinous material | SHIPLEY CO LLC (US) | 2006-06-07 | — | — | EP | claimed |
| US-20050214448-A1 | Compositions containing heterocyclic nitrogen compounds and glycols for texturing resinous material and desmearing and removing resinous meterial | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) | 2005-09-29 | — | — | US | claimed |
| EP-0866110-B1 | Light-emitting material for organo-electroluminescence device and organic electroluminescence device | TOYO INK MFG CO (JP) | 2004-10-20 | — | — | EP | claimed |
| US-20030021887-A1 | Compositions containing heterocylcic nitrogen compounds and glycols for texturing resinous material and desmearing and removing resinous material | SHIPLEY COMPANY, L.L.C. | 2003-01-30 | — | — | US | claimed |
| EP-1241209-A2 | Solvent swell containing heterocyclic nitrogen compounds and glycols for texturing resinous material and desmearing and removing resinous material | Shipley Co. L.L.C. (US) | 2002-09-18 | — | — | EP | claimed |
| EP-0589427-B1 | Thermosensitive recording medium | DAINIPPON INK & CHEMICALS (JP) | 1997-03-12 | — | — | EP | claimed |
| US-5518982-A | SOLID SOLUTION, IMPROVED IMAGE STABILITY, PAPER FOR FACSIMILE, THERMAL PRINTING | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1996-05-21 | — | — | US | claimed |
| EP-0589427-A2 | Thermosensitive recording medium | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1994-03-30 | — | — | EP | claimed |
| US-4607071-A | Process for spin-dyeing of acid-modified polymers of copolymers of acrylonitrile using rapid-fixing di-quaternary cationic dyes | HOECHST AKTIENGESELLSCHAFT (DE) | 1986-08-19 | — | — | US | claimed |