Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.55 |
| ▸ | TSHR | P16473 | 9/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 3/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL6676468 | 0.87 | — | — | |
| SCHEMBL1564172 | 0.85 | ALDH1A1 (0.40) | ALDH1A1TSHRLMNAHSD17B10HPGD | |
| Acrylic Acid SCHEMBL28659504 | 0.85 | LMNA (0.50) | ALDH1A1TSHRLMNAHSD17B10HPGD | |
| Bicarbonate SCHEMBL28785631 | 0.84 | — | — | |
| Urea SCHEMBL27407445 | 0.82 | — | — | |
| SCHEMBL4948994 | 0.81 | — | — | |
| Acrylic Acid SCHEMBL29073994 | 0.81 | LMNA (0.46) | ALDH1A1TSHRLMNAHSD17B10HPGD | |
| SCHEMBL9715008 | 0.81 | ALDH1A1 (0.39) | ALDH1A1TSHRLMNAHSD17B10GLO1 | |
| Methacrylic Acid SCHEMBL5624304 | 0.81 | THRB (0.36) | ALDH1A1TSHRLMNAHSD17B10GLO1 | |
| Methyl Alcohol SCHEMBL28252725 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110383426-A | The manufacturing method of the surface treatment method and semiconductor substrate of surface treating composition and its manufacturing method and use surface treating composition | 福吉米株式会社 | 2019-10-25 | — | — | CN | disclosed |
| CN-106019869-B | Image forming method, electrostatic charge image developer group and image forming apparatus | 柯尼卡美能达株式会社 | 2019-10-01 | — | — | CN | disclosed |
| CN-106019869-A | Image forming method, electrostatic charge image developer set, and image forming apparatus | 柯尼卡美能达株式会社 | 2016-10-12 | — | — | CN | disclosed |
| EP-0586508-B1 | THERMALLY PROCESSABLE BLENDS OF HIGH MODULUS POLYURETHANES AND MASS POLYMERIZED ABS RESINS | DOW CHEMICAL CO (US) | 1998-05-06 | — | — | EP | disclosed |
| US-5491194-A | TOUGHNESS, STIFFNESS | THE DOW CHEMICAL COMPANY (US) | 1996-02-13 | — | — | US | disclosed |
| EP-0586508-A4 | THERMALLY PROCESSABLE BLENDS OF HIGH MODULUS POLYURETHANES AND MASS POLYMERIZED ABS RESINS. | DOW CHEMICAL CO (US) | 1995-05-10 | — | — | EP | disclosed |
| EP-0586508-A1 | THERMALLY PROCESSABLE BLENDS OF HIGH MODULUS POLYURETHANES AND MASS POLYMERIZED ABS RESINS | THE DOW CHEMICAL COMPANY (US) | 1994-03-16 | — | — | EP | disclosed |
| WO-1992020744-A1 | THERMALLY PROCESSABLE BLENDS OF HIGH MODULUS POLYURETHANES AND MASS POLYMERIZED ABS RESINS | THE DOW CHEMICAL COMPANY (US) | 1992-11-26 | — | — | WO | disclosed |