SCHEMBL8745509

SCHEMBL8745509

Cc1ccc(S(=O)(=O)CS(=O)(=O)c2ccc(C)c(C)c2)cc1C

nearest known ligand 0.59

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.59
HTT P42858 2/20 0.59
LMNA P02545 2/20 0.59
TDP1 Q9NUW8 1/20 0.59
PKM P14618 3/20 0.47
PLCG1 P19174 1/20 0.46
NPC1 O15118 1/20 0.45
RAB9A P51151 1/20 0.45
GAA P10253 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
TSHR P16473 1/20 0.43
MAPT P10636 1/20 0.42
MAPK1 P28482 1/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
KDM4E B2RXH2 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5591289 0.88 ALDH1A1 (0.57) ALDH1A1HTTLMNATDP1PKM
SCHEMBL8745525 0.81 ALDH1A1 (0.46) ALDH1A1HTTLMNATDP1PKM
SCHEMBL47890 0.78 LMNA (0.67) ALDH1A1HTTLMNATDP1PKM
SCHEMBL18263431 0.77 ALDH1A1 (0.58) ALDH1A1HTTLMNATDP1PKM
SCHEMBL15460389 0.76 LMNA (0.64) ALDH1A1HTTLMNATDP1PKM
SCHEMBL758951 0.76 LMNA (0.64) ALDH1A1HTTLMNATDP1PKM
SCHEMBL18503866 0.75 ALDH1A1 (1.00) ALDH1A1HTTLMNATDP1SMN1; SMN2
SCHEMBL11331050 0.75 ALDH1A1 (0.57) ALDH1A1HTTLMNATDP1PKM
SCHEMBL12218198 0.75 ALDH1A1 (1.00) ALDH1A1HTTLMNATDP1GAA
SCHEMBL83885 0.74 LMNA (0.61) ALDH1A1HTTLMNATDP1PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0654149-B1 POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH HOECHST AG (DE) 1997-02-05 EP disclosed
EP-0654149-A1 POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH. HOECHST AG (DE) 1995-05-24 EP disclosed
WO-1994003837-A1 POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH HOECHST AKTIENGESELLSCHAFT (DE) 1994-02-17 WO disclosed