SCHEMBL8750402

SCHEMBL8750402

CCCCC(Cc1cc(C)cc(C)c1)OC(CCCC)Cc1cc(C)cc(C)c1

nearest known ligand 0.36

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.36
PRKCD Q05655 1/20 0.36
BDKRB2 P30411 4/20 0.35
NR3C1 P04150 1/20 0.34
PGR P06401 1/20 0.34
NR3C2 P08235 1/20 0.34
CNR1 P21554 2/20 0.33
CNR2 P34972 2/20 0.33
CTSK P43235 3/20 0.32
TACR1 P25103 1/20 0.32
PTGES O14684 1/20 0.31
ALOX5 P09917 1/20 0.31
PPARG P37231 1/20 0.31
CTSL P07711 1/20 0.31
CTSB P07858 1/20 0.31
SLC7A5 Q01650 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15187854 0.76 TACR1 (0.34) NR3C1PGRNR3C2TACR1CTSL
SCHEMBL4953348 0.74 CTSK (0.51) CNR2CTSKCTSLCTSB
SCHEMBL9233306 0.72 CSNK1E (0.53) CNR2CTSKCTSLCTSB
SCHEMBL2843204 0.71 DNM1 (0.43) PRKCAPRKCD
SCHEMBL8750396 0.71 ESR1 (0.38) BDKRB2NR3C1PGRNR3C2CTSK
SCHEMBL21268585 0.70 CSNK1E (0.55) CNR2CTSKCTSLCTSB
SCHEMBL21268584 0.70 CSNK1E (0.55) CNR2CTSKCTSLCTSB
SCHEMBL21268579 0.70 CSNK1E (0.55) CNR2CTSKCTSLCTSB
SCHEMBL9232199 0.70 CSNK1E (0.55) CNR2CTSKCTSLCTSB
Ammonia Solution, Strong SCHEMBL1333604 0.69 DNM1 (0.41) PRKCAPRKCD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0523697-B1 Color-developing compositions and their use MITSUI TOATSU CHEMICALS (JP) 1997-04-02 EP disclosed
US-5447901-A Color-developing sheet: base material coated with composition of /a/ multivalent metal-modified salicylic acid resin formed from salicylic acid, a benzyl compound and optional styrene and /b/ analogous resin free of salicylic acid MITSUI TOATSU CHEMICAL, INC. (JP) 1995-09-05 US disclosed
US-5376615-A Pressure sensitive elements containing a salicylic acid resin and a phenolic resin MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1994-12-27 US disclosed
EP-0523697-A1 Color-developing compositions and their use MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-01-20 EP disclosed