SCHEMBL8750460

SCHEMBL8750460

CC(CCCOCCCC(C)c1ccccc1)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
RIPK1 Q13546 1/20 0.52
TAAR1 Q96RJ0 3/20 0.48
TRPA1 O75762 3/20 0.44
AOC3 Q16853 2/20 0.44
ALDH1A1 P00352 1/20 0.41
HPGD P15428 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8750373 0.94 RIPK1 (0.50) RIPK1TAAR1TRPA1AOC3ALDH1A1
SCHEMBL18382467 0.90 RIPK1 (0.47) RIPK1TAAR1TRPA1AOC3ALDH1A1
SCHEMBL27410794 0.88 RIPK1 (0.42) RIPK1TAAR1TRPA1AOC3ALDH1A1
SCHEMBL28593180 0.87 RIPK1 (0.55) RIPK1TAAR1TRPA1AOC3
SCHEMBL2092474 0.86 ALDH1A1 (0.54) RIPK1TAAR1TRPA1AOC3ALDH1A1
SCHEMBL2702882 0.85 RIPK1 (0.46) RIPK1TAAR1TRPA1AOC3ALDH1A1
SCHEMBL2092472 0.84 RIPK1 (0.48) RIPK1TAAR1TRPA1AOC3ALDH1A1
SCHEMBL11917878 0.84 RIPK1 (0.53) RIPK1TAAR1TRPA1AOC3ALDH1A1
SCHEMBL8750449 0.82 ACHE (0.42) RIPK1ALDH1A1HPGD
SCHEMBL7784138 0.80 HRH1 (0.58) TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119977795-A Efficient chemical recovery method for waste polyester fabrics 南亚塑胶工业股份有限公司 2025-05-13 CN claimed
CN-114920652-B Method for synthesizing 1-alkylstyrene derivative by photocatalysis 宁波工程学院 2024-04-19 CN disclosed
EP-0523697-B1 Color-developing compositions and their use MITSUI TOATSU CHEMICALS (JP) 1997-04-02 EP disclosed
US-5447901-A Color-developing sheet: base material coated with composition of /a/ multivalent metal-modified salicylic acid resin formed from salicylic acid, a benzyl compound and optional styrene and /b/ analogous resin free of salicylic acid MITSUI TOATSU CHEMICAL, INC. (JP) 1995-09-05 US disclosed
US-5376615-A Pressure sensitive elements containing a salicylic acid resin and a phenolic resin MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1994-12-27 US disclosed
EP-0523697-A1 Color-developing compositions and their use MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-01-20 EP disclosed