SCHEMBL8766587

SCHEMBL8766587

CCc1ccc(N(c2cccc(CC)c2)c2cccc(N(c3ccc(CC)cc3)c3cccc(CC)c3)c2)cc1

nearest known ligand 0.44

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.44
SIGMAR1 Q99720 17/20 0.44
CYP1A2 P05177 1/20 0.41
CYP2A6 P11509 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8765716 0.94 SIGMAR1 (0.47) TP53SIGMAR1
SCHEMBL8765073 0.91 RAPGEF4 (0.41) TP53SIGMAR1CYP1A2CYP2A6
SCHEMBL76603 0.90 TP53 (0.52) TP53SIGMAR1CYP1A2CYP2A6
SCHEMBL13136839 0.90 TP53 (0.52) TP53SIGMAR1CYP1A2CYP2A6
SCHEMBL10066019 0.90 TP53 (0.52) TP53SIGMAR1CYP1A2CYP2A6
SCHEMBL17678530 0.88 BCL2 (0.46) TP53SIGMAR1
SCHEMBL12957222 0.88 TP53 (0.54) TP53SIGMAR1CYP1A2CYP2A6
SCHEMBL13136832 0.86 CYP2C19 (0.44) TP53SIGMAR1
SCHEMBL21392008 0.86 CYP2C19 (0.44) TP53SIGMAR1
SCHEMBL14114271 0.85 BCL2 (0.44) SIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0420207-B1 Electrophotosensitive material and method of manufacturing the same MITA INDUSTRIAL CO LTD (JP) 1997-08-13 EP disclosed
EP-0390196-B1 Electrophotosensitive material MITA INDUSTRIAL CO LTD (JP) 1995-09-20 EP disclosed
US-5185228-A Binder resin, charge transfer material; stability MITA INDUSTRIAL CO., LTD. (JP) 1993-02-09 US disclosed
US-5128229-A Polycarbonate, m-phenylenediamine derivative MITA INDUSTRIAL CO., LTD. (JP) 1992-07-07 US disclosed
US-5059503-A Used for copying machine MITA INDUSTRIAL CO., LTD. (JP) 1991-10-22 US disclosed
EP-0420207-A2 Electrophotosensitive material and method of manufacturing the same MITA INDUSTRIAL CO. LTD. (JP) 1991-04-03 EP disclosed
EP-0413338-A1 Electrophotosensitive material MITA INDUSTRIAL CO. LTD. (JP) 1991-02-20 EP disclosed
EP-0390196-A2 Electrophotosensitive material MITA INDUSTRIAL CO., LTD. (JP) 1990-10-03 EP disclosed