⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4439355 | 0.90 | — | — | |
| SCHEMBL48646 | 0.85 | — | — | |
| SCHEMBL1720385 | 0.85 | CYP1A2 (0.39) | — | |
| SCHEMBL1720393 | 0.85 | — | — | |
| SCHEMBL12270736 | 0.84 | — | — | |
| SCHEMBL9693141 | 0.81 | CA2 (0.44) | — | |
| SCHEMBL15605765 | 0.81 | MAOA (0.40) | — | |
| SCHEMBL8463463 | 0.81 | CA2 (0.47) | — | |
| SCHEMBL347724 | 0.81 | CASP2 (0.44) | — | |
| SCHEMBL9821164 | 0.81 | CASP2 (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3037511-B1 | SEMI-AQUEOUS PHOTORESIST OR SEMICONDUCTOR MANUFACTURING RESIDUE STRIPPING AND CLEANING COMPOSITION WITH IMPROVED SILICON PASSIVATION | VERSUM MAT US LLC (US) | 2022-07-06 | — | — | EP | claimed |
| EP-3037511-A1 | SEMI-AQUEOUS PHOTORESIST OR SEMICONDUCTOR MANUFACTURING RESIDUE STRIPPING AND CLEANING COMPOSITION WITH IMPROVED SILICON PASSIVATION | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-06-29 | — | — | EP | claimed |
| US-20160179011-A1 | Semi-Aqueous Photoresist or Semiconductor Manufacturing Residue Stripping and Cleaning Composition with Improved Silicon Passivation | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-06-23 | — | — | US | claimed |
| EP-0792146-A1 | INACTIVATION OF PATHOGENS USING HYDROXYMETHYLAMINES | HEMASURE, INC. (US) | 1997-09-03 | — | — | EP | claimed |
| WO-1997002028-A1 | INACTIVATION OF PATHOGENS USING HYDROXYMETHYLAMINES | HEMASURE, INC. (US) | 1997-01-23 | — | — | WO | claimed |
| US-20240209234-A1 | NON-SPHERICAL PRIMARY SILICA NANOPARTICLES AND THE USE THEREFOR | VERSUM MATERIALS US, LLC | 2024-06-27 | — | — | US | disclosed |
| EP-4326678-A1 | NON-SPHERICAL PRIMARY SILICA NANOPARTICLES AND THE USE THEREFOR | Versum Materials US, LLC (US) | 2024-02-28 | — | — | EP | disclosed |
| EP-3037511-B1 | SEMI-AQUEOUS PHOTORESIST OR SEMICONDUCTOR MANUFACTURING RESIDUE STRIPPING AND CLEANING COMPOSITION WITH IMPROVED SILICON PASSIVATION | VERSUM MAT US LLC (US) | 2022-07-06 | — | — | EP | disclosed |
| EP-3423028-B1 | METHOD FOR THE PRODUCTION OF ENCAPSULATED FRAGRANCE WITH IMPROVED STABILITY AGAINST DETERGENTS | SYMRISE AG (DE) | 2020-04-08 | — | — | EP | disclosed |
| US-10073351-B2 | Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation | VERSUM MATERIALS US, LLC (US) | 2018-09-11 | — | — | US | disclosed |
| EP-3037511-A1 | SEMI-AQUEOUS PHOTORESIST OR SEMICONDUCTOR MANUFACTURING RESIDUE STRIPPING AND CLEANING COMPOSITION WITH IMPROVED SILICON PASSIVATION | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-06-29 | — | — | EP | disclosed |
| US-20160179011-A1 | Semi-Aqueous Photoresist or Semiconductor Manufacturing Residue Stripping and Cleaning Composition with Improved Silicon Passivation | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-06-23 | — | — | US | disclosed |
| EP-2325236-A1 | Dendritic polymers with enhanced amplification and interior functionality | Dendritic Nanotechnologies Inc. (US) | 2011-05-25 | — | — | EP | disclosed |
| EP-0792146-A1 | INACTIVATION OF PATHOGENS USING HYDROXYMETHYLAMINES | HEMASURE, INC. (US) | 1997-09-03 | — | — | EP | disclosed |
| WO-1997002028-A1 | INACTIVATION OF PATHOGENS USING HYDROXYMETHYLAMINES | HEMASURE, INC. (US) | 1997-01-23 | — | — | WO | disclosed |