SCHEMBL879243

SCHEMBL879243

CCC(C)C(=O)OC1CCCC(OC)O1

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CHRNB4 P30926 1/20 0.32
CHRNA3 P32297 1/20 0.32
HSD17B10 Q99714 1/20 0.31
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL786034 0.78 HTT (0.39) CHRNB4CHRNA3HTT
SCHEMBL785889 0.76 HTT (0.36) CHRNB4CHRNA3HTT
SCHEMBL26499139 0.74 BCHE (0.32) HSD17B10
SCHEMBL1350834 0.74 EPHX1 (0.43) CHRNB4CHRNA3HTT
SCHEMBL9620141 0.73 ALDH1A1 (0.33) HTT
SCHEMBL12895425 0.72 EPHX2 (0.31) CHRNB4CHRNA3
SCHEMBL9620140 0.72
SCHEMBL11941672 0.72 FKBP1A (0.33)
SCHEMBL18119958 0.71 CHRM2 (0.34) HSD17B10
SCHEMBL2681050 0.71 EPHX1 (0.47) HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2296039-B1 Positive photosensitive composition FUJIFILM CORP (JP) 2013-09-25 EP disclosed
EP-1179750-B1 Positive photosensitive composition and method for producing a precision integrated circuit element using the same FUJIFILM CORP (JP) 2012-07-25 EP disclosed
EP-1273970-B1 Positive photosensitive composition FUJIFILM CORP (JP) 2012-03-28 EP disclosed
US-7977029-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2011-07-12 US disclosed
US-7977029-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2011-07-12 US disclosed
US-7514201-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2009-04-07 US disclosed
US-20080318159-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2008-12-25 US disclosed
US-20080318159-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2008-12-25 US disclosed
US-20070141513-A1 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. 2007-06-21 US disclosed
US-7192681-B2 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2007-03-20 US disclosed
US-7192681-B2 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2007-03-20 US disclosed