SCHEMBL8794822

SCHEMBL8794822

O=S(=O)(Oc1ccccc1)c1cccs1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 1/20 0.47
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA9 Q16790 1/20 0.45
CYP2C9 P11712 2/20 0.43
CYP2C19 P33261 2/20 0.43
PKM P14618 2/20 0.43
CYP2D6 P10635 1/20 0.43
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
F2 P00734 2/20 0.42
POLB P06746 1/20 0.42
CYP3A4 P08684 1/20 0.42
MAPT P10636 1/20 0.42
HTR1A P08908 1/20 0.42
DRD2 P14416 1/20 0.42
HTR7 P34969 1/20 0.42
HTR6 P50406 1/20 0.42
ALDH1A1 P00352 2/20 0.42
HTT P42858 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11198231 0.98 RAB9A (0.46) RAB9ACA1CA2CA9CYP2C9
SCHEMBL14594625 0.84 F2 (0.41) RAB9ACYP2C9CYP2C19PKMCYP2D6
SCHEMBL11589613 0.84 JAK2 (0.46) RAB9ACYP2C9CYP2C19PKMCYP2D6
SCHEMBL14594623 0.79 CA1 (0.53) CA1CA2CA9CYP2C9CYP2C19
SCHEMBL927567 0.78 SMN1; SMN2 (0.45) RAB9ACYP2C9CYP2C19PKMCYP2D6
SCHEMBL28504937 0.77 CYP2C9 (0.50) CYP2C9CYP2C19PKMCYP2D6MEN1
SCHEMBL8795305 0.75 NPC1 (0.44) RAB9ACYP2C9CYP2C19CYP2D6MEN1
Hydrogen Sulfide SCHEMBL28882430 0.75 F2 (0.40) CYP2C9CYP2C19PKMCYP2D6MEN1
SCHEMBL22735265 0.74 PKM (0.44) CA1CA2CA9CYP2C9CYP2C19
SCHEMBL9491112 0.74 F2 (0.50) CYP2C9CYP2C19PKMCYP2D6MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108368243-B Resin for printing ink, varnish for printing ink, and method for producing resin for printing ink 哈利玛化成株式会社 2021-08-20 CN disclosed
US-9447303-B2 Composition for forming resist underlayer film JSR CORPORATION (JP) 2016-09-20 US disclosed
US-20150197664-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM JSR CORPORATION (JP) 2015-07-16 US disclosed
US-9040232-B2 Method for pattern formation, method and composition for resist underlayer film formation, and resist underlayer film JSR CORPORATION (JP) 2015-05-26 US disclosed
US-20120129353-A1 METHOD FOR PATTERN FORMATION, METHOD AND COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND RESIST UNDERLAYER FILM JSR CORPORATION (JP) 2012-05-24 US disclosed
US-20120129353-A1 METHOD FOR PATTERN FORMATION, METHOD AND COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND RESIST UNDERLAYER FILM JSR CORPORATION (JP) 2012-05-24 US disclosed
CN-1284079-A Novel compounds ASTRA ZENECA BRITISH LTD (GB) 2001-02-14 CN disclosed