Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.45 |
| ▸ | F2 | P00734 | 2/20 | 0.41 |
| ▸ | CNR2 | P34972 | 1/20 | 0.40 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | TERT | O14746 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.36 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Sulfide SCHEMBL28882430 | 0.78 | F2 (0.40) | SMN1; SMN2F2CNR2TP53ALDH1A1 | |
| SCHEMBL8794822 | 0.78 | RAB9A (0.47) | F2CNR2ALDH1A1TERTHTT | |
| SCHEMBL14594625 | 0.77 | F2 (0.41) | SMN1; SMN2F2TP53ALDH1A1TERT | |
| SCHEMBL28299218 | 0.77 | NPC1 (0.54) | SMN1; SMN2F2TP53ALDH1A1HTT | |
| SCHEMBL11589613 | 0.77 | JAK2 (0.46) | SMN1; SMN2F2TP53ALDH1A1HTT | |
| SCHEMBL11198231 | 0.76 | RAB9A (0.46) | F2CNR2TP53ALDH1A1TERT | |
| SCHEMBL14594628 | 0.76 | TERT (0.39) | SMN1; SMN2F2CNR2TP53ALDH1A1 | |
| SCHEMBL2057733 | 0.73 | TDP1 (0.58) | SMN1; SMN2ALDH1A1HTTKMT2AMEN1 | |
| SCHEMBL14594623 | 0.72 | CA1 (0.53) | SMN1; SMN2ALDH1A1HTTCYP2D6CYP2C9 | |
| SCHEMBL4401079 | 0.71 | CYP3A4 (0.51) | SMN1; SMN2TP53ALDH1A1HTTPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8609013-B2 | Method of fabricating a microfabricated structure | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-12-17 | — | — | US | disclosed |
| EP-1942375-B1 | Inkjet printer head comprising photosensitive polymer complex containing silver nanoparticles and method of preparing the photosensitive polymer complex | SAMSUNG ELECTRONICS CO LTD (KR) | 2013-02-27 | — | — | EP | disclosed |
| US-8383317-B2 | Surface treatment of interpenetrating polymer networkcarbon tubes; photolithography; modifying surfaces of carbon nanotubes with polymerizable functional groups such as oxirane and anhydride groups; heat curing; negative patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-02-26 | — | — | US | disclosed |
| US-8211957-B2 | Negative pattern of carbon nanotubes and carbon nanotube composite comprising surface-modified carbon nanotubes | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-07-03 | — | — | US | disclosed |
| US-7923110-B2 | Metal nanoparticle having a self-assembled monolayer on its surface, and formation of conductive pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-04-12 | — | — | US | disclosed |
| US-7875416-B2 | Composition for forming photosensitive polymer complex and method of preparing photosensitive polymer complex containing silver nanoparticles using the composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-01-25 | — | — | US | disclosed |
| US-20100323298-A1 | Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof | PARK JONG JIN | 2010-12-23 | — | — | US | disclosed |
| US-7803514-B2 | Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-09-28 | — | — | US | disclosed |
| US-20100159219-A1 | Negative pattern of carbon nanotubes and carbon nanotube composite comprising surface-modified carbon nanotubes | PARK JONG JIN | 2010-06-24 | — | — | US | disclosed |
| US-20090206520-A1 | Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof | SAMSUNG ELECTRONICS CO., LTD. | 2009-08-20 | — | — | US | disclosed |
| US-7256419-B2 | Composition for forming organic insulating film and organic insulating film formed from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-08-14 | — | — | US | disclosed |
| US-7229747-B2 | Surface treatment of interpenetrating polymer networkcarbon tubes; photolithography; heat curing; negative patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-12 | — | — | US | disclosed |
| EP-1542241-B1 | Composition for forming organic insulating film and organic insulating film formed from the same | SAMSUNG ELECTRONICS CO LTD (KR) | 2006-09-27 | — | — | EP | disclosed |
| US-20050127355-A1 | Composition for forming organic insulating film and organic insulating film formed from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-06-16 | — | — | US | disclosed |
| EP-1542241-A1 | Composition for forming organic insulating film and organic insulating film formed from the same | Samsung Electronics Co., Ltd (KR) | 2005-06-15 | — | — | EP | disclosed |
| US-20040265755-A1 | Surface treatment of interpenetrating polymer networkcarbon tubes; photolithography; heat curing; negative patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-12-30 | — | — | US | disclosed |
| EP-1457821-A1 | Method of making carbon nanotube patterned film or carbon nanotube composite material using a composition comprising carbon nanotubes surface-modified with polymerizable moieties | Samsung Electronics Co., Ltd. (KR) | 2004-09-15 | — | — | EP | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100159219-A1 | Negative pattern of carbon nanotubes and carbon nanotube composite comprising surface-modified carbon nanotubes | ACTN4, NCDN, PNN | SMN1; SMN2 1816/4885F2 4464/4885CNR2 2138/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.