SCHEMBL8813853

SCHEMBL8813853

CCOC(=O)C(C(=O)OCC)C(CC)[Si](OCC)(OCC)OCC

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.36
LMNA P02545 2/20 0.35
NPSR1 Q6W5P4 2/20 0.35
MAPT P10636 1/20 0.35
HPGD P15428 1/20 0.35
RAB9A P51151 1/20 0.35
KMT2A Q03164 1/20 0.35
HSD17B10 Q99714 1/20 0.34
GAA P10253 2/20 0.33
ALOX15 P16050 1/20 0.33
MGAM O43451 1/20 0.33
SI P14410 1/20 0.33
MGAM2 Q2M2H8 1/20 0.33
SOAT1 P35610 1/20 0.33
TP53 P04637 2/20 0.33
TSHR P16473 1/20 0.33
HTT P42858 1/20 0.32
TRPA1 O75762 1/20 0.31
KDM4E B2RXH2 1/20 0.31
PIN1 Q13526 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6888156 0.84 ALDH1A1 (0.36) ALDH1A1LMNANPSR1MAPTHPGD
SCHEMBL8959216 0.82
SCHEMBL28334108 0.77
SCHEMBL7130482 0.76 LMNA (0.32) ALDH1A1LMNAHTT
SCHEMBL8413238 0.72 ALDH1A1 (0.40) ALDH1A1LMNAHPGDHSD17B10GAA
SCHEMBL2460611 0.72 ALDH1A1 (0.56) ALDH1A1LMNANPSR1MAPTHPGD
SCHEMBL443030 0.72 MGAM (0.30) GAAMGAMSIMGAM2
SCHEMBL23164135 0.70 ALDH1A1 (0.42) ALDH1A1LMNANPSR1MAPTHPGD
Ethane SCHEMBL27513819 0.70 ALDH1A1 (0.42) ALDH1A1LMNANPSR1MAPTHPGD
SCHEMBL7512461 0.69 ALDH1A1 (0.46) ALDH1A1LMNANPSR1MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5698309-A OXIDE PARTICLES HAVE BEEEN SUBJECTED TO SURFACE MODIFICATION WITH SILYLATING AGENT HOECHST AKTIENGESELLSCHAFT (DE) 1997-12-16 US disclosed
US-5494949-A SILANIZING INORGANIC OXIDES FOR COVALENT BONDING TO POLYESTER; FILLERS, REDUCTION OF VOIDS IN FILMS MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1996-02-27 US disclosed