Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 4/20 | 0.32 |
| ▸ | NPC1 | O15118 | 2/20 | 0.32 |
| ▸ | RAB9A | P51151 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | ADH1B | P00325 | 1/20 | 0.32 |
| ▸ | ADH1C | P00326 | 1/20 | 0.32 |
| ▸ | ADH1A | P07327 | 1/20 | 0.32 |
| ▸ | ADH4 | P08319 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL888279 | 0.97 | ALDH1A1 (0.35) | ALDH1A1HSD17B10NPSR1POLBEPHX2 | |
| SCHEMBL723852 | 0.80 | ALDH1A1 (0.39) | ALDH1A1HSD17B10NPSR1POLBEPHX2 | |
| SCHEMBL2999986 | 0.80 | ALDH1A1 (0.39) | ALDH1A1HSD17B10NPSR1POLBEPHX2 | |
| SCHEMBL11059965 | 0.78 | ALDH1A1 (0.38) | ALDH1A1HSD17B10NPSR1POLBEPHX2 | |
| SCHEMBL4210578 | 0.78 | ALDH1A1 (0.38) | ALDH1A1HSD17B10NPSR1POLBEPHX2 | |
| SCHEMBL4211760 | 0.77 | ALDH1A1 (0.35) | ALDH1A1HSD17B10NPSR1POLBEPHX2 | |
| SCHEMBL3010190 | 0.77 | ALDH1A1 (0.35) | ALDH1A1HSD17B10NPSR1POLBEPHX2 | |
| SCHEMBL4213117 | 0.75 | ALDH1A1 (0.33) | ALDH1A1HSD17B10NPSR1POLB | |
| SCHEMBL4202092 | 0.75 | NPSR1 (0.37) | ALDH1A1HSD17B10NPSR1POLBEPHX2 | |
| SCHEMBL28995357 | 0.75 | THRB (0.36) | ALDH1A1HSD17B10NPSR1EPHX1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250285785-A1 | DRY FILM | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-09-11 | — | — | US | disclosed |
| US-11721543-B2 | Planarizing process and composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2023-08-08 | — | — | US | disclosed |
| US-20230053355-A1 | Dry Film | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2023-02-23 | — | — | US | disclosed |
| CN-109789644-B | Dielectric film forming composition | 富士胶片电子材料美国有限公司 | 2023-01-31 | — | — | CN | disclosed |
| EP-4091000-A1 | DRY FILM | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2022-11-23 | — | — | EP | disclosed |
| CN-115280188-A | Dry film | 富士胶片电子材料美国有限公司 | 2022-11-01 | — | — | CN | disclosed |
| EP-4041803-A1 | PLANARIZING PROCESS AND COMPOSITION | FUJIFILM Electronic Materials U.S.A., Inc. (US) | 2022-08-17 | — | — | EP | disclosed |
| CN-114787240-A | Planarization method and composition | 富士胶片电子材料美国有限公司 | 2022-07-22 | — | — | CN | disclosed |
| CN-109790405-B | Dielectric film forming composition | 富士胶片电子材料美国有限公司 | 2022-07-15 | — | — | CN | disclosed |
| WO-2021067547-A1 | PLANARIZING PROCESS AND COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-04-08 | — | — | WO | disclosed |
| US-8367310-B2 | Pattern forming process and resist-modifying composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| US-8329384-B2 | Resist-modifying composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-11 | — | — | US | disclosed |
| US-20110269926-A1 | SOLID CATALYST COMPONENT FOR OLEFIN POLYMERIZATION, MANUFACTURING METHOD, AND CATALYST AND OLEFIN POLYMER MANUFACTURING METHOD | TOHO TITANIUM CO., LTD. (JP) | 2011-11-03 | — | — | US | disclosed |
| EP-2374821-A1 | SOLID CATALYST COMPONENT FOR OLEFIN POLYMERIZATION, MANUFACTURING METHOD, AND CATALYST AND OLEFIN POLYMER MANUFACTURING METHOD | Toho Titanium CO., LTD. (JP) | 2011-10-12 | — | — | EP | disclosed |
| US-20110033799-A1 | PATTERN FORMING PROCESS, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST-MODIFYING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-02-10 | — | — | US | disclosed |
| US-20100297554-A1 | RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100297563-A1 | RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100209849-A1 | PATTERN FORMING PROCESS AND RESIST-MODIFYING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
| US-20100159392-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100086878-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |